“…A variety of light sources have been used for UVPD, including excimer lasers (e.g., F 2 : 157 nm, 7.9 eV per photon; ArF: 193 nm, 6.4 eV per photon; and XeF: 351 nm, 3.5 eV per photon), solid state Nd:YAG lasers (213 nm, 5.8 eV per photon; 266 nm, 4.7 eV per photon; or 355 nm, 3.5 eV per photon), gas-discharge lamps, synchrotron radiation, and even light-emitting diodes (LEDs) in one report . More powerful lasers or ones with high repetition rates enable UVPD on a fast time scale and are particularly beneficial for higher-throughput LC-MS applications.…”