2023
DOI: 10.1109/jlt.2023.3239614
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Uncooled 100-GBaud Directly Modulated Membrane Lasers on SiC Substrate

Abstract: We investigate the temperature dependence of the dynamic characteristics of a 1.3-m InGaAlAs-based directly modulated membrane laser on a SiC substrate. The laser is fabricated by combining direct wafer bonding of SiC and InP substrates using a very thin (~10 nm) oxide layer and epitaxial regrowth of a membrane InP layer on the InP/SiC template. The membrane laser structure on SiC with a high thermal conductivity (490 Wm -1 K -1 ) and a moderate refractive index (~2.6) ensures both high thermal dissipation an… Show more

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Cited by 15 publications
(9 citation statements)
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“…uncooled operation of DML even up to 85 o C, our focus remains on our PPR membrane DMLs on high-thermal-conductivity SiC substrates [15].…”
Section: B Device Characteristicsmentioning
confidence: 99%
See 1 more Smart Citation
“…uncooled operation of DML even up to 85 o C, our focus remains on our PPR membrane DMLs on high-thermal-conductivity SiC substrates [15].…”
Section: B Device Characteristicsmentioning
confidence: 99%
“…However, the intrinsic (i.e., carrier-photon) dynamics in DMLs impose limitations on the achievable bandwidth based on the relaxation oscillation frequency (𝑓 𝑅 ), which, in turn, is proportional to the square-root of the operating bias current (𝐼 𝑏 ) above threshold (𝐼 𝑡ℎ ) , 𝑓 𝑅 ∝ √𝐼 𝑏 − 𝐼 𝑡ℎ , leading to an intrinsic power consumption -bandwidth tradeoff [11,12]. To address this tradeoff, laser designs incorporating integrated optical feedback that take advantage of cavity and longitudinal modal effects [14][15][16][17][18][19][20][21][22][23], notably the photon-photon resonance (PPR) effect, can be used to boost DML bandwidths by over 2 times without the need to increase the bias current. Using such PPR-enabled designs, we have previously demonstrated a record 108 GHz DML bandwidth over a membrane laser fabricated on a highthermal-conductivity SiC substrate [14] and a ~60 GHz, S. Yamaoka was previously with NTT Device Technology Labs, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa, 243-0198 Japan and now he is with NTT Access Network Service Systems Labs, Nippon Telegraph and Telephone Corporation, Yokosuka, Kanagawa, 239-0847 Japan (e-mail: suguru.yamaoka@ntt.com).…”
Section: Introductionmentioning
confidence: 99%
“…For wafer-scale integration, recently RT direct bonding on surface-activated SiO 2 helped to reduce the thermal impedance, 17) also on a 2 inch wafer scale with SiO 2 thickness of only 10 nm. 18) However, the process of direct surface-activated bonding on SiO 2 puts high requirements on surface cleanness, low roughness, and a high level of planarization; otherwise, defects are inevitable on a wafer scale. That is why direct bonding is mostly used for active devices with lateral current injection, such as in Ref.…”
Section: Introductionmentioning
confidence: 99%
“…On the one hand, external modulator-based transmitters such as silicon-photonic [5,6], plasmonic [7][8][9], and thin-film Lithium Niobate-(TFLN) [10][11][12][13] Mach-Zehnder modulators (MZM) or micro-ring modulators (MRM) [14][15][16] have shown excellent performance in terms of bandwidth and modulation linearity for high baud rate operation, however, requiring high-power external light sources to operate. On the other hand, monolithically integrated transmitters such as electro-absorption modulated lasers (EML) [17][18][19][20][21][22][23][24][25] and directly modulated lasers (DML) [26][27][28][29][30][31] with a potentially smaller footprint and lower power consumption, also show promising characteristics in supporting over 200 Gb/s/lane transmissions. Moreover, recent efforts in monolithically integrating laser sources with TFLN modulators have been reported [32].…”
mentioning
confidence: 99%