2001
DOI: 10.1063/1.1400085
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Uniform patterned growth of carbon nanotubes without surface carbon

Abstract: In order to utilize the unique properties of carbon nanotubes in microelectronic devices, it is necessary to develop a technology which enables high yield, uniform, and preferential growth of perfectly aligned nanotubes. We demonstrate such a technology by using plasma-enhanced chemical-vapor deposition (PECVD) of carbon nanotubes. By patterning the nickel catalyst, we have deposited uniform arrays of nanotubes and single free-standing aligned nanotubes at precise locations. In the PECVD process, however, detr… Show more

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Cited by 330 publications
(197 citation statements)
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“…Compared to other growth techniques, PECVD has become a very promising method because vertically aligned CNTs/CNFs can be grown at relatively low temperature. Moreover the radius and length of the CNTs/CNFs can be controlled over a wide range [6].…”
Section: Introductionmentioning
confidence: 99%
“…Compared to other growth techniques, PECVD has become a very promising method because vertically aligned CNTs/CNFs can be grown at relatively low temperature. Moreover the radius and length of the CNTs/CNFs can be controlled over a wide range [6].…”
Section: Introductionmentioning
confidence: 99%
“…Annealing the as-deposited film causes dewetting (also referred to as agglomeration), by which a population of nanoparticles are created by atomic surface diffusion at high temperature. 19 Although other methods of preparing the catalyst nanoparticles such as by optical and electron beam lithography, 20 colloidal self-assembly, 21,22 and block copolymer self-assembly 23 have been used to successfully grow CNTs, thin film dewetting remains the most common, owing to its simplicity, ease of integration with CNT processing, and its scalability.…”
Section: Catalyst Preparation and Treatmentmentioning
confidence: 99%
“…Keeping the NH 3 flow rate fixed at 200sccm, the C 2 H 2 flow rate was varied in a series of depositions to determine the optimal conditions at which no a-C remains on the substrate. The thickness of surface a-C was determined using a combination of cross sectional SEM and depth resolved Auger Electron Spectroscopy [25] and the results are plotted in Figure 2. Deposition gas ratios of 15% and 20% C 2 H 2 :NH3 do not produce amorphous carbon on the substrate.…”
Section: (C) High Yield Of Nanotubes Is Observed When Ni Are Formed mentioning
confidence: 99%