Uniformity of postprocessing of dense nanotube arrays by neutral and ion fluxes

Levchenko, Igor; Ostrikov, Kostya Ken; Tam, Eugene

doi:10.1063/1.2388941

Cited by 82 publications

(48 citation statements)

References 27 publications

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“…It should be noted that the previous simulation studies [11][12][13][14][15][16] on the plasma growth of nanostructures have shown that the ion coverage is affected by varying the process parameters. Therefore, although this non-uniformity is not significant, the experimental conditions should be adjusted to maximize the uniformity of passivation of the textured Si surfaces.…”

Section: Discussionmentioning

confidence: 99%

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The effect of microscopic texture on the direct plasma surface passivation of Si solar cells

Mehrabian

Qaemi

et al. 2013

Physics of Plasmas

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The effect of microscopic texture on the direct plasma surface passivation of Si solar cells AbstractTextured silicon surfaces are widely used in manufacturing of solar cells due to increasing the light absorption probability and also the antireflection properties. However, these Si surfaces have a high density of surface defects that need to be passivated. In this study, the effect of the microscopic surface texture on the plasma surface passivation of solar cells is investigated. The movement of 105Hþ ions in the texture-modified plasma sheath is studied by Monte Carlo numerical simulation. The hydrogen ions are driven by the combined electric field of the plasma sheath and the textured surface. The ion dynamics is simulated, and the relative ion distribution over the textured substrate is presented. This distribution can be used to interpret the quality of the Si dangling bonds saturation and consequently, the direct plasma surface passivation. Textured silicon surfaces are widely used in manufacturing of solar cells due to increasing the light absorption probability and also the antireflection properties. However, these Si surfaces have a high density of surface defects that need to be passivated. In this study, the effect of the microscopic surface texture on the plasma surface passivation of solar cells is investigated. The movement of 10 5 H þ ions in the texture-modified plasma sheath is studied by Monte Carlo numerical simulation. The hydrogen ions are driven by the combined electric field of the plasma sheath and the textured surface. The ion dynamics is simulated, and the relative ion distribution over the textured substrate is presented. This distribution can be used to interpret the quality of the Si dangling bonds saturation and consequently, the direct plasma surface passivation. V C 2013 American Institute of Physics. [http://dx

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Section: Discussionmentioning

confidence: 99%

“…[11][12][13][14][15] The model is applicable for the investigation of the effect of the plasma environment on the growth of the nanostructured surfaces. This model has recently been advanced to include the effect of the cone-like nanostructures.…”

Section: Introductionmentioning

confidence: 99%

The effect of microscopic texture on the direct plasma surface passivation of Si solar cells

Mehrabian

Qaemi

et al. 2013

Physics of Plasmas

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“…Using the macroscopic formulation from Refs. [2,39,40], we can write the dimensionless energy of an adatom as [2] …”

Section: Discussion and Analysismentioning

confidence: 99%

Diffusivity of adatoms on plasma-exposed surfaces determined from the ionization energy approximation and ionic polarizability

Arulsamy¹,

Ostrikov²

2009

Physics Letters A

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Microscopic surface diffusivity theory based on atomic ionization energy concept is developed to explain the variations of the atomic and displacement polarizations with respect to the surface diffusion activation energy of adatoms in the process of self-assembly of quantum dots on plasma-exposed surfaces. These polarizations are derived classically, while the atomic polarization is quantized to obtain the microscopic atomic polarizability. The surface diffusivity equation is derived as a function of the ionization energy. The results of this work can be used to fine-tune the delivery rates of different adatoms onto nanostructure growth surfaces and optimize the low-temperature plasma based nanoscale synthesis processes.

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“…[3][4][5][6][7][8] In most of these applications, high aspect ratio and vertically aligned nanostructures 9 can sustain a high electron current and strong electron field emission from the sharp tips, which often have a radius of curvature of several nanometers. [10][11][12] Such applications impose very strict requirements on the height uniformity of the carbon nanostructures throughout the entire array. Indeed, a nonuniform array that consists of nanostructures of different lengths cannot provide adequate emission parameters ͑e.g., current density and service lifetime͒ due to overload.…”

Section: Introductionmentioning

confidence: 99%

Plasma-controlled metal catalyst saturation and the initial stage of carbon nanostructure array growth

Levchenko

Ostrikov

Mariotti

et al. 2008

Journal of Applied Physics

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The kinetics of the nucleation and growth of carbon nanotube and nanocone arrays on Ni catalyst nanoparticles on a silicon surface exposed to a low-temperature plasma are investigated numerically, using a complex model that includes surface diffusion and ion motion equations. It is found that the degree of ionization of the carbon flux strongly affects the kinetics of nanotube and nanocone nucleation on partially saturated catalyst patterns. The use of highly ionized carbon flux allows formation of a nanotube array with a very narrow height distribution of half-width 7 nm. Similar results are obtained for carbon nanocone arrays, with an even narrower height distribution, using a highly ionized carbon flux. As the deposition time increases, nanostructure arrays develop without widening the height distribution when the flux ionization degree is high, in contrast to the fairly broad nanostructure height distributions obtained when the degree of ionization is low.

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Uniformity of postprocessing of dense nanotube arrays by neutral and ion fluxes

Cited by 82 publications

References 27 publications

The effect of microscopic texture on the direct plasma surface passivation of Si solar cells

The effect of microscopic texture on the direct plasma surface passivation of Si solar cells

Diffusivity of adatoms on plasma-exposed surfaces determined from the ionization energy approximation and ionic polarizability

Plasma-controlled metal catalyst saturation and the initial stage of carbon nanostructure array growth

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