2020
DOI: 10.1016/j.apmt.2019.100541
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Universal and scalable route to fabricate GaN nanowire-based LED on amorphous substrate by MOCVD

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Cited by 30 publications
(28 citation statements)
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“…4(e and f), as it was observed in our previous publications. 26,37 The optical properties of the active region grown on the semi-polar plane are enhanced when the inclination angle of the polar-plane to the semi-polar growth plane ranges from 45 to 60 . For the incorporation of indium into the InGaN QWs, over a wide range of growth temperatures, the most favorable planes are (11 22) and (10 21).…”
Section: Resultsmentioning
confidence: 99%
“…4(e and f), as it was observed in our previous publications. 26,37 The optical properties of the active region grown on the semi-polar plane are enhanced when the inclination angle of the polar-plane to the semi-polar growth plane ranges from 45 to 60 . For the incorporation of indium into the InGaN QWs, over a wide range of growth temperatures, the most favorable planes are (11 22) and (10 21).…”
Section: Resultsmentioning
confidence: 99%
“…The melting temperature of the catalyst (Au or Ni for GaN NW growth) can be reduced by alloying it with low melting‐point metals such as indium (In) or gallium (Ga). [ 40,41 ]…”
Section: Introductionmentioning
confidence: 99%
“… 29 The triangle-shaped GaN shell was annealed in NH 3 at the same temperature adopting the same approach as reported in our previous work. 30 The grown GaN shell acted as a host for the monocrystalline growth of InGaN/GaN MQW shells. High crystal quality InGaN/GaN MQWs are expected to grow around the triangle-shaped GaN shells.…”
Section: Resultsmentioning
confidence: 99%
“…After the growth of the GaN shell, a postgrowth nitridation was conducted to improve the crystal quality up to the atomic level as reported in our previous work. 30 Subsequent to the shell growth of GaN, the InGaN-QW/GaN-barrier shells were grown, and the flow rates of TMGa and NH 3 were maintained as 31.6 μmol·min –1 and 357 mmol·min –1 , respectively. To grow the InGaN QW, the flow rates of TMGa and NH 3 were fixed at 27.6 μmol min –1 and 357 mmol min –1 , whereas the flow rate of TMIn varied as 17.3, 34.6, and 51.9 μmol min –1 for samples LIn, MIn, and HIn, respectively.…”
Section: Experimental Proceduresmentioning
confidence: 99%