We report here studies on the influence of oxygen pressure on the electroresistance behavior of La 0.9 Sr 0.1 MnO 3 thin films fabricated by laser molecular beam epitaxy. It was found that the film deposited at lower oxygen pressure shows larger c-axis parameter, higher resistance, and more distinct electroresistance. These results reveal that the electroresistance of manganite thin films can be tuned by the conditions of film fabrication. La 0.9 Sr 0.1 MnO 3 thin film, electroresistance effect, laser molecular beam epitaxy Colossal magnetoresistive (CMR) materials with the type R 1 x A x MnO 3 (R is a trivalent rare-earth ion and A is a divalent dopant) have triggered intensive interest due to their plentiful electronic and magnetic phase diagram. These materials exhibit different ground states, and an external disturbance, such as pressure, electric current and light illumination, can easily drive the system from one state to another state [1 3] . Recently, numerous efforts have been made to characterize and understand the effect of electric current on the transport property of CMR materials [4 12] . It was reported that increasing the applied electric current can increase (decrease) the resistivity drastically, resulting in giant positive (negative) electroresistance (ER). Previous reports on ER effect concentrate mainly on the manganite thin films with the doping level around x~1/3, and rare work has been done on lightly doped lanthanum manganese oxides. The light-doped samples, such as La 0.9 Sr 0.1 MnO 3 , are demonstrated to show some advantageous features in p-n junctions [13,14] . So, their ER behaviors might also exhibit some interesting features. On the other hand, the manganite thin films showing giant ER effect were usually fabricated by pulsed laser deposition, and thus the