2011
DOI: 10.1143/jjap.50.04dc12
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Universal Relationship between Substrate Current and History Effect in Silicon-on-Insulator Metal–Oxide–Semiconductor Field-Effect Transistors

Abstract: transition for samples comprised of N spins. While we find power-law scaling of τ versus N for small Q 50 and N 40 2 , we observe a crossover to exponential scaling for larger Q. These results demonstrate that despite the ensemble optimization, broad-histogram simulations cannot fully eliminate the supercritical slowing down at strongly first-order transitions.

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