Surface
states of mesoporous NiO semiconductor films have particular
properties differing from the bulk and are able to dramatically influence
the interfacial electron transfer and adsorption of chemical species.
To achieve a better performance of NiO-based p-type dye-sensitized
solar cells (p-DSCs), the function of the surface states has to be
understood. In this paper, we applied a modified atomic layer deposition
procedure that is able to passivate 72% of the surface states on NiO
by depositing a monolayer of Al
2
O
3
. This provides
us with representative control samples to study the functions of the
surface states on NiO films. A main conclusion is that surface states,
rather than the bulk, are mainly responsible for the conductivity
in mesoporous NiO films. Furthermore, surface states significantly
affect dye regeneration (with I
–
/I
3
–
as redox couple) and hole transport in NiO-based p-DSCs.
A new dye regeneration mechanism is proposed in which electrons are
transferred from reduced dye molecules to intra-bandgap states, and
then to I
3
–
species. The intra-bandgap
states here act as catalysts to assist I
3
–
reduction. A more complete mechanism is suggested to understand
the particular hole transport behavior in p-DSCs, in which the hole
transport time is independent of light intensity. This is ascribed
to the percolation hole hopping on the surface states. When the concentration
of surface states was significantly reduced, the light-independent
charge transport behavior in pristine NiO-based p-DSCs transformed
into having an exponential dependence on light intensity, similar
to that observed in TiO
2
-based n-type DSCs. These conclusions
on the function of surface states provide new insight into the electronic
properties of mesoporous NiO films.