2024
DOI: 10.1002/adom.202400939
|View full text |Cite
|
Sign up to set email alerts
|

Unveiling the Nanomorphology of HfN thin Films by Ultrafast Reciprocal Space Mapping

Steffen Peer Zeuschner,
Jan‐Etienne Pudell,
Maximilian Mattern
et al.

Abstract: Hafnium Nitride (HfN) is a promising and very robust alternative to gold for applications of nanoscale metals. Details of the nanomorphology related to variations in strain states and optical properties can be crucial for applications in nanophotonics and plasmon‐assisted chemistry. Ultrafast reciprocal space mapping (URSM) with hard X‐rays is used to unveil the nanomorphology of thin HfN films. Static high‐resolution X‐ray diffraction reveals a twofold composition of the thin films being separated into region… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 45 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?