Halogen bonding (HaB) is a weak interaction
that assists
in the
recognition of nucleophilic molecules. However, HaB elements are currently
under-investigated as a part of functional materials in separation
science. Herein, we develop a novel approach for introducing HaB elements
into UiO-66 to fine-tune the adsorption properties toward chlorobenzenes
(CBs). A series of UiO-66 containing various contents of 2-iodoterephtalic
acid (I-TA) (0%, 33%, 50%, 67%, and 100%) was prepared, characterized,
and applied for the selective removal of CB contaminants from nonchlorinated
aromatic analogues that cannot be separated by common distillation.
Investigation of the structure–property relationship revealed
that the highest adsorption capacity was achieved in the case of UiO-66
loaded with 50% I-TA (UiO-66-Iopt), and this was attributed
to the balance between the number of HaB elements and the surface
area of the UiO-66 structure. According to density functional theory
calculations, the formation of a conjugate between dichlorobenzene
and UiO-66-Iopt was more energetically favorable (up to
1.7 kcal/mol) than that of the corresponding conjugate with UiO-66.
The formation of HaBs was experimentally verified by UV–vis,
Raman, and X-ray photoelectron spectroscopies. To obtain functional
materials for separation applications, waste polyethylene terephthalate
(PET) was used as a support and feedstock for the surface-assisted
growth of UiO-66-Iopt. The as-prepared PET@UiO-66-Iopt exhibited a close-to-perfect selectivity and reusability
for the separation of a wide range of CBs from nonchlorinated aromatic
analogues.