“…This alloy (in thin film form) shows to be promising as both, etch stop [1,2] and hard mask layer [3] to assist nanoelectronic patterning, and as low dielectric constant (known as low-k) interfacial dielectric material [4], diffusion barrier [S-7], and pore sealants [8]. Optoelectronic applications as another important area include the use of a-SiC photodiodes in optical communications [9], optical/image sensors [10] and LED's applications [11].…”