“…The Hall effect is called underdeveloped, when the Hall mobility, μ Hall , is substantially smaller than the longitudinal field‐effect mobility, μ FET , (μ Hall < μ FET ), and, respectively, the Hall carrier density, n Hall , is systematically greater than the capacitively defined (total) carrier density, n FET , induced in the accumulation channel ( n Hall > n FET ) . To understand the mechanism of this effect, besides blends, we have also investigated high‐quality polycrystalline rubrene thin films with a large grain size previously developed by Fusella et al These films can be viewed as an ideal polycrystalline organic semiconductor due to the very large grain size of up to ≈1 mm and crystallographically well‐defined grain boundaries, with a highly compact film morphology extended over macroscopically large areas (up to 1 cm 2 ). In OFETs, such rubrene films ensure just a few discrete GBs in the channel and result in relatively high field‐effect mobilities, μ FET = 1–4 cm 2 V −1 s −1 .…”