2004
DOI: 10.1002/sia.1923
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Use of C60 cluster projectiles for sputter depth profiling of polycrystalline metals

Abstract: We have investigated the merits of fullerene cluster ions as projectiles in time-of-flight secondary neutral mass spectrometry (ToF-SNMS) sputter depth profiling of an Ni : Cr multilayer sample similar to the corresponding NIST depth profiling standard. It is shown that sputter erosion under bombardment with C 60 + ions of kinetic energies between 10 and 20 keV provides good depth resolution corresponding to interface widths of several nanometres. This depth resolution is maintained during the complete removal… Show more

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Cited by 56 publications
(48 citation statements)
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“…In comparison to experiments with metal samples, Sun et al previously determined the interface width between the two constituents of the Ni:Cr sample to be approximately 8.7 nm in thickness for an incident energy of 20 keV. 11 This value is consistent with the result from this simulation giving that about 8-9 nm of topography has been created in removing only 0.24 nm of material as shown in Figures 2 and 3. Thus crater depths calculated for single impacts on flat surfaces are not appropriate for experimental interface widths.…”
Section: Resultssupporting
confidence: 81%
See 1 more Smart Citation
“…In comparison to experiments with metal samples, Sun et al previously determined the interface width between the two constituents of the Ni:Cr sample to be approximately 8.7 nm in thickness for an incident energy of 20 keV. 11 This value is consistent with the result from this simulation giving that about 8-9 nm of topography has been created in removing only 0.24 nm of material as shown in Figures 2 and 3. Thus crater depths calculated for single impacts on flat surfaces are not appropriate for experimental interface widths.…”
Section: Resultssupporting
confidence: 81%
“…1,2 Their abilities of nonlinear enhancement of yield, reduced chemical damage, and reduced damage depth have opened the door to a wide array of depth profiling capabilities. [3][4][5][6][7][8][9][10][11][12] For example, it is possible to analyze multilayered structures used in the electronics/semiconductor industry, 6,13 as well as perform molecular specific depth profiles of cells and other biologically important systems. [13][14][15][16][17][18][19][20] The critical issue for quantitative interpretation of depth profiles is the interface width, a quantity that reflects how precisely one can measure a change in composition.…”
Section: Introductionmentioning
confidence: 99%
“…For example, these sources can be focused onto the sample with a probe size about 1 micron, allowing greatly improved molecule-specific imaging experiments. The high secondary ion yield associated with the cluster/solid interaction also allows for molecular depth profiling studies without the accompanying damage accumulation normally associated with atomic bombardment [7][8][9][10][11][12][13][14][15][16][17].…”
mentioning
confidence: 99%
“…So, it was necessary to decrease the crater size and to increase the bombarding energy in order to hold duration of the analysis in the acceptable limits. Beam-induced interlayer mixing contributes to the degradation of SIMS profiles as well; it can be considerably suppressed only by lowering the bombarding energy down to 100-200 eV [37] or by using polyatomic or cluster projectiles [38][39][40]. At present, such techni- ques are beyond the capabilities of the SIMS instrument used in this study.…”
Section: Resultsmentioning
confidence: 95%