1999 Fifth European Conference on Radiation and Its Effects on Components and Systems. RADECS 99 (Cat. No.99TH8471)
DOI: 10.1109/radecs.1999.858604
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Use of commercial VDMOSFETs in electronic systems subjected to radiation

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Cited by 2 publications
(4 citation statements)
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“…This might be in conjunction with diffusion of some neutral species -hydrogen molecules from the position of high concentration (oxide) toward lower concentration (interface). Threshold voltage shift almost linearly decreases with log(t), which is in agreement with comparable published results [9] (power MOS, 105 nm gate oxide, annealed at 175 • C), and also agrees with the switching-oxide trap model used originally as the so-called HDL model in interpreting irradiation effects [46], [47] and later in NBTI phenomena [34], [48]- [50].…”
Section: Resultssupporting
confidence: 91%
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“…This might be in conjunction with diffusion of some neutral species -hydrogen molecules from the position of high concentration (oxide) toward lower concentration (interface). Threshold voltage shift almost linearly decreases with log(t), which is in agreement with comparable published results [9] (power MOS, 105 nm gate oxide, annealed at 175 • C), and also agrees with the switching-oxide trap model used originally as the so-called HDL model in interpreting irradiation effects [46], [47] and later in NBTI phenomena [34], [48]- [50].…”
Section: Resultssupporting
confidence: 91%
“…The obtained results are in excellent agreement with the results of the low-dose bias irradiation experiment (up to 150 Gy at ±9 V) by Johnson et al, performed on power p-channel DMOS devices at cryogenic temperatures [6]. It should be mentioned, however, that a significant difference in radiation response between commercial power VDMOSFETs biased with +10 V and −10 V gate voltage during the Co-60 irradiation was observed at extremely high doses (−40 V threshold voltage shift has been achieved at 7.8 Mrad) [9]. Fig.…”
Section: Resultsmentioning
confidence: 99%
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“…The method that consists of annealing MOSFEiTs at a temperature higher than room temperature enables acceleration of recovery phenomena [5][6] [7]. This also means much faster achievement of a stable condition than would be possible at room temperature, a phenomenon also observed in the present study, particularly for positive biases.…”
Section: Discussionmentioning
confidence: 51%