2013
DOI: 10.1007/s11664-013-2935-y
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Use of Electrochemical Etching to Produce Doped Phenylacetylene Functionalized Particles and Their Thermal Stability

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Cited by 7 publications
(3 citation statements)
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“…56 It is also possible to use FTIR to show the compensation of carriers with varied concentrations of phosphorus and boron when codoped. 45 FTIR has also been used to determine if phenylacetylene ligands were situated on the surface of a set of NCs, 89 and in a similar manner to prove that NH 3 or NO 2 gases were adsorbed onto the NCs. 70,90 FT-IR has also been used to investigate the hypervalent surface interactions in Cl terminated Si NCs.…”
Section: Spectroscopic Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…56 It is also possible to use FTIR to show the compensation of carriers with varied concentrations of phosphorus and boron when codoped. 45 FTIR has also been used to determine if phenylacetylene ligands were situated on the surface of a set of NCs, 89 and in a similar manner to prove that NH 3 or NO 2 gases were adsorbed onto the NCs. 70,90 FT-IR has also been used to investigate the hypervalent surface interactions in Cl terminated Si NCs.…”
Section: Spectroscopic Methodsmentioning
confidence: 99%
“…For example, Si NCs were prepared through electrochemically etching and then functionalized with phenylacetylene (PA). 89 As an alternative, NCs may be treated with gas which, through adsorption, acts as a dopant; the pressure of the gas controls the amount of gas adsorbed to the particle surface. 70,90 Dopant concentrations were determined to be 10 18 cm −3 for NH 3 and 10 19 cm −3 for NO 2 gases.…”
Section: Doping Post Synthesismentioning
confidence: 99%
“…62 Additionally, because the narrow particle size distributions of the intrinsic SiQDs are already accessible using well-established procedures, it is reasonable that these approaches will provide control over the dimensions of the resulting doped particles. 4,32 Important progress has been realized in post-synthesis doping of a variety of Si nanostructures (e.g., porous Si, 63,64 oxide-embedded SiQDs, [65][66][67][68] Si nanowires 69 ) that provides a valuable basis for doping in SiQDs. To date, post-synthesis doping of freestanding SiQDs has only been reported using ligand substitution.…”
Section: Introductionmentioning
confidence: 99%