2015
DOI: 10.1016/j.jphotochem.2015.07.015
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Use of graphite oxide and/or thermally reduced graphite oxide for the removal of dyes from water

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Cited by 12 publications
(3 citation statements)
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“…When damage occurs within graphite oxide layer, chemical bonds of GO layers must have been broken. Since the GO was not oxidized completely, the interaction force between the layers was mainly based on hydrogen bond formed by oxygen containing functional group and van der Waals forces [17][18][19][20][21]. When interlaminar peeling happens, this special force must be overcome, which will lead large amounts of energy consumption as well.…”
Section: Resultsmentioning
confidence: 99%
“…When damage occurs within graphite oxide layer, chemical bonds of GO layers must have been broken. Since the GO was not oxidized completely, the interaction force between the layers was mainly based on hydrogen bond formed by oxygen containing functional group and van der Waals forces [17][18][19][20][21]. When interlaminar peeling happens, this special force must be overcome, which will lead large amounts of energy consumption as well.…”
Section: Resultsmentioning
confidence: 99%
“…This can be attributed to the presence of EG which is photosensitizing in nature. 54 It can also be observed that Pd-ZnO-EG displayed a better photo-response in the visible light region with a higher intensity relative to the asprepared ZnO-EG. Firstly, this better photoresponse is an indication of the addition of Pd to the ZnO-EG material.…”
Section: Uv-visible Analysismentioning
confidence: 87%
“…Graphene oxide (GO) and reduced graphene oxide (rGO) with large surface area have also emerged as potential adsorbents for RhB removal. 14,[25][26][27][28][29] The presence of predominant oxygenated groups in GO and p-p conjugated structure in rGO provide electrostatic and p-p interactions, respectively, that promote the RhB adsorption. Furthermore, the surface charge density of these GO based materials can easily be adjusted, providing greater control over the dye adsorption process.…”
Section: Introductionmentioning
confidence: 99%