Use of microwave plasma torch atomic emission spectrometry for the determination of silicon

Liang, Feng; Zhang, Hanqi; Jin, Qing; Zhang, Daxin; Lei, Yahu; Jin, Qinhan

doi:10.1007/s002160050174

Cited by 15 publications

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References 13 publications

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“…ICP optical emission spectrometry [ 15 , 16 , 17 , 18 , 19 ], AAS atomic absorption spectrometry [ 20 , 21 , 22 , 23 , 24 , 25 ], X-ray XRF and fluorescence [ 26 ] are increasingly widely used to determine silicon in various materials. The ICP-OES or ICP-AES technique (the same technique; different abbreviations are given by the authors) measurement parameters include the selection of the analytical line, selection of plasma observation conditions, gas flow rate, radio frequency generator power, photomultiplier voltage, integration time and the amount of sample to be administered.…”

Section: Introductionmentioning

confidence: 99%

A New Approach to the Determination of Silicon in Zinc, Lead-Bearing Materials and in Waste Using the ICP-OES Method

2022

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This work describes the implementation of the ICP-OES silicon determination method for zinc and lead-bearing materials and waste at the Mining and Metallurgical Works ZGH “Bolesław”. The proposed method was validated. On the basis of linearity tests, it was found that the course of the calibration curve is linear up to a silicon concentration of 100 mg/L, with the determined working range being 0.10–50%. Precision tests, on the basis of which the repeatability was checked, were carried out for nine types of real samples: zinc sulfides, zinc oxides, zinc-lead ore, lead sulfide and zinc-bearing waste. Real samples and six certified reference materials were tested using the ICP-OES radial position. The identified interferences of molybdenum, chromium and vanadium did not statistically significantly affect the measurement results.

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Section: Introductionmentioning

confidence: 99%

A New Approach to the Determination of Silicon in Zinc, Lead-Bearing Materials and in Waste Using the ICP-OES Method

2022

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“…Kamson and Townshend 7 and Marshall and Van Staden 8 used this technique to eliminate the matrix effects in the determination of calcium and selenium, and arsenic, respectively. Liang et al 9 used this technique to eliminate some concomitant cations in the determination of silicon.…”

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Wang

Zhang

et al. 2001

J. Anal. At. Spectrom.

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Microwave‐Induced Plasma Systems in Atomic Spectroscopy

Broekaert

Engel

2000

Encyclopedia of Analytical Chemistry

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The use of microwave plasmas as radiation sources for optical atomic emission (AES), absorption (AAS) and fluorescence (AFS) spectroscopy and for laser ionization spectroscopy is treated and reference is also made to the use of microwave‐induced plasmas (MIPs) as ion sources for mass spectrometry (MS). Devices for producing both single‐electrode and electrodeless microwave plasmas are treated, in addition to methods for their diagnostics, and results for the analytically relevant plasma parameters are presented. Methods for sample introduction are discussed. They include dry aerosol generation techniques (hydride generation (HG), electrothermal evaporation, spark and laser ablation (LA)) and possibilities for the uptake of wet aerosols. Special reference is made to coupling with gas chromatography (GC) and also to the potential for coupling with high‐performance liquid chromatography (HPLC) Further, the use of microwave plasmas for cross‐excitation in the case of glow discharges (GDs) is treated. The analytical figures of merit in the case of AES with low‐power microwave plasmas, single‐electrode microwave plasmas, plasma torch sources and stabilized capacitively coupled plasmas are given also in the case of atomic absorption, fluorescence and laser ionization with these sources. The developments in MS in the case of both low‐power and high‐power microwave plasmas and in the case of various types of sample introduction are discussed. Applications of MIP atomic spectroscopy are in the fields of biological samples with special reference to microanalysis, and of environmental samples with special emphasis on metal speciation, on‐line monitoring and direct solids analysis. A critical comparison of the methodology with other methods for the determination of the elements and their species is given.

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Use of microwave plasma torch atomic emission spectrometry for the determination of silicon

Cited by 15 publications

References 13 publications

A New Approach to the Determination of Silicon in Zinc, Lead-Bearing Materials and in Waste Using the ICP-OES Method

A New Approach to the Determination of Silicon in Zinc, Lead-Bearing Materials and in Waste Using the ICP-OES Method

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Microwave‐Induced Plasma Systems in Atomic Spectroscopy

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