2002
DOI: 10.1063/1.1479456
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Use of near-surface channel conductance and differential capacitance versus potential measurements to correlate inversion layer formation with low effective surface recombination velocities at n-Si/liquid contacts

Abstract: Near-surface channel conductance measurements, differential capacitance versus potential measurements, and surface recombination velocity measurements have been performed on ͑111͒-and ͑100͒-oriented n-type Si samples in contact with nitrogen and/or liquid electrolyte solutions containing I 2 , I 2 /I Ϫ , ferrocene, or decamethylferrocene ϩ/0 in either methanol or tetrahydrofuran. Si/liquid contacts that displayed a low effective surface recombination velocity S corresponded to those that formed an inversion la… Show more

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Cited by 16 publications
(19 citation statements)
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“…The band shift at the organic layer/silicon interface due to Qit and Qot is important for reducing surface recombination velocity. A similar phenomenon was observed in other organic materials [1,4].…”
Section: Surface Passivation Effects Of Wafer Immersion In Qm Solutionsupporting
confidence: 76%
“…The band shift at the organic layer/silicon interface due to Qit and Qot is important for reducing surface recombination velocity. A similar phenomenon was observed in other organic materials [1,4].…”
Section: Surface Passivation Effects Of Wafer Immersion In Qm Solutionsupporting
confidence: 76%
“…A few recipes for a covalent molecular anchoring on silicon have been reported, sometimes associated with claims of a superior and long-term stability of the Si-C bond in hydrolytic conditions, which instead severely affects Si-O-R bonds [2,3,[5][6][7][8][9][10][11][12][13][14][15][16][17][18]. The electronic communication between silicon substrate and attached molecules has also been tested, mainly by means of electrochemical methods in a solution [4,[19][20][21][22] and, in a limited number of cases, in the solid state [23][24][25][26], and the importance of the nature of the contact has been discussed. However, it has not yet been clarified in the literature on Si-organics hybrids, if the roadmap to robust and reliable Si-based molecular electronics should select one among the existing Siorganics covalent bond already tested (mainly Si-C, Si-O, Si-P), or explore further ones.…”
Section: Introductionmentioning
confidence: 99%
“…52,18 The unique reactivity of HSi(111) surfaces with alcohols, including CH 3 OH, has been exploited as a versatile method to impart a desired functionality to the surface via the robust Si-O bond, without formation of a thick insulating silicon oxide layer on the surface. For example, n-Si/CH 3 OH junctions have yielded high open-circuit voltages (632-640 mV) and high device efficiencies (12-14%) [53][54] in regenerative photoelectrochemical cells, with the device performance correlated with low surface recombination velocities [55][56][57] as well as the favorable band-edge positions 58 of the methoxylated Si surface. The methoxy termination can moreover be converted to F-termination or OHtermination,5 double-side polished, 300 ± 25 µm thick, oriented within 0.5° of the (111) crystal plane, and had a resistivity of 0.40 Ω cm.…”
Section: -49mentioning
confidence: 99%