Abstract:In this study, the hydrothermal method was used to synthesize ZnO nanorods and ZnO nanoflower arrays. Two different substrates were used to prepare the ZnO seed layer. For the p-type silicon <100> wafer, a prepared ZnO gel was deposited as the seed layer using the spin coating method. When a patterned sapphire recess-type substrate was used as a template, Al film, with a thickness of 120 nm, and OE-6370HF AB glue were used as a sacrificial layer and an imprinting lithography carrier for the ZnO seed laye… Show more
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