Using femtosecond laser pulses to investigate the thickness-dependent nonlinear optical properties of nickel oxide thin films and their potential use as optical limiters

Abstract

In this study, the Z-scan technique was used to investigate the nonlinear optical properties of nickel oxide (NiO) thin films of various thicknesses. Direct current (DC) sputtering was used to deposit single-phase NiO thin films with thicknesses of 280, 350, and 470 nm onto a soda-lime glass substrate. The film structure was measured using X-ray diffraction (XRD) and scanning electron microscopy (SEM), while the linear optical properties were measured using a UV-Vis spectrophotometer. NiO thin films were irradiated with 100 fs laser pulses at various excitation wavelengths and excitation powers to determine the nonlinear absorption coefficient and nonlinear refractive index. The NiO films were found to have reverse saturable absorption and self-focusing behavior. As the thickness of the NiO film increases, both the nonlinear absorption coefficient and nonlinear refractive index decrease. Additionally, the investigation of the optical limitations of NiO thin films revealed a definite association with the thickness of the NiO thin film.