Using soft lithography to fabricate GaAs/AlGaAs heterostructure field effect transistors

Hu, Junmin; Beck, R. G.; Deng, Tao; Westervelt, Robert; Maranowski, K. D.; Gossard, A. C.; Whitesides, George M.

doi:10.1063/1.119774

Cited by 62 publications

(41 citation statements)

References 11 publications

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“…Lowtemperature synthesis of nanoporous ZnO/dye hybrid thin films by one-step cathodic electrodeposition from an aqueous mixed solution of Zn salt and water-soluble dyes has been demonstrated. [12] The deposited hybrid films exhibit decent sensitized photoanodic properties without applying high-temperature annealing. A simple method to fabricate porous TiO 2 layers has recently been developed by Lindström et al by mechanical compression of additive-free TiO 2 paste on a conductive substrate.…”

Section: Methodsmentioning

confidence: 99%

Low‐Temperature Fabrication of Efficient Porous Titania Photoelectrodes by Hydrothermal Crystallization at the Solid/Gas Interface

Yoshida²,

2003

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is distance between the electrodes and h 0 is the thickness of the template. The second term is the Laplace pressure, and P 0 is atmospheric pressure, with the other variables being previously defined. If DP > 0, the PDMS will be drawn into the template. Figure 5B shows the PDMS surface produced with a 1.09 10 5 PS-b-PMMA template (Fig. 3B). As can be seen, the diameter and separation distance of the pores in the template have been replicated with high fidelity. However, even with an applied field of 3.5 kV cm ±1 , the discs on the PDMS surface are only 6 nm in height, in comparison to the pore depth of 40 nm. Consequently, while the applied field has enhanced the filling of the pores, complete filling of the pores has not occurred. It should be noted that, if the porous template is removed from the substrate and placed on the surface of liquid PDMS, the pores of the template will fill and the template will sink into the PDMS. Consequently, the failure to completely fill the porous template on the surface of a substrate by the three routes discussed, is a consequence of the difficulty in removing air trapped in the base of the pores. In addition, it is not possible to independently determine whether the nanoscopic cylinders have been torn during removal. Though the uniform height of the cylinders seen would argue against this. All efforts, to date, have been unsuccessful in perfect replication. Thus, while the lateral features of the template can be replicated with high fidelity, the heights of the replicated features, while uniform, did not match those of the master. Nonetheless, the replicas have a well-defined and controllable topography and are being examined for use in nano-contact printing. ExperimentalA hydroxy end-functionalized random copolymer of styrene and methyl methacrylate, denoted PS-r-PMMA, having a styrene fraction of 0.6, was synthesized in bulk via a 2,2,6,6-tetramethylpiperidin-1-yl oxide (TEMPO) ªliv-ingº free-radical polymerization. The molecular weight was determined to be M w = 9600 with M w /M n = 1.80 by size-exclusion chromatography. The random copolymer was anchored to the native oxide surface of silicon substrates by annealing spin coated films under vacuum at 165 C for 3 days. This allows the alcohol end group to diffuse to and covalently bond to the oxide surface. After rinsing with toluene a well-defined, thin layer of PS-r-PMMA having thickness of~6 nm remained. Asymmetric PS-b-PMMA was synthesized by anionic polymerization. The molecular weights of PS-b-PMMA used in this study were 69 000, 73 400, and 109 000 g mol ±1 with polydispersities of~1.06. These copolymers are designated as 69 K, 73 K, and 109 K, respectively.Films with thickness about the bulk period (L 0 ) of the block copolymers were prepared by spin casting toluene solutions of the block copolymers onto surfaces to which the random copolymer was grafted. Film thickness was measured with a Rudolph Research AutoEL-II ellipsometer using a helium-neon laser (k = 632.8 nm) at a 70 incidence angle. The samples were anneal...

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Section: Methodsmentioning

confidence: 99%

Low‐Temperature Fabrication of Efficient Porous Titania Photoelectrodes by Hydrothermal Crystallization at the Solid/Gas Interface

Yoshida²,

2003

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“…[23] Recently, several other applications of MIMIC, such as nanopatterning using different classes of materials, that is, metallic [24] and magnetic nanoparticles (NPs), [25] nanoclusters, [26] organic semiconductors, [27,28] and biomolecules, [29] have been proposed.…”

Section: Reviewmentioning

confidence: 99%

Nanopatterning Soluble Multifunctional Materials by Unconventional Wet Lithography

2009

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Molecular multifMolecular multifunctional materials have potential applications in many fields of technology, such as electronics, optics and optoelectronics, information storage, sensing, and energy conversion and storage. These materials are designed exhibit enhanced properties, and at the same time are endowed with functional groups that control their interactions, and hence self-organization, into a variety of supramolecular architectures. Since most of the multifunctional materials are soluble, lithographic methods suitable for solutions are attracting increasing interest for the manufacturing of the new materials and their applications. The aim of this paper is to highlight some of the recent advances of solution-based fabrication of multifunctional materials. We explain and examine the principles, processes, materials, and limitations of this class of patterning techniques, which we term unconventional wet lithographies (UWLs). We describe their ability to yield patterns and structures whose feature sizes range from nanometers to micrometers. In the following sections, we focus our attention on micromolding in capillaries, lithographically controlled wetting, and grid-assisted deposition, the most used methods demonstrated to lead to fully operating devices

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“…Replication of nanostructures into polymers is used to make electronic, [49][50][51][52][53][54][55][56][57][58][59] optical, [60][61][62][63][64] and mechanical [65][66][67][68][69] devices. Single-layer, subwavelength, optical elements, e.g., frequency-selective surfaces (Fig.…”

Section: Imprint Lithographiesmentioning

confidence: 99%

“…This molecule acts as an etch resist and permits the selective etching of unprotected regions. This technique was used to fabricate polarizers, [28] hydrogen-gas sensors, [72] transistors, [50,52] and microelectromechanical systems (MEMS) devices. [69,73] The imprint lithographies use the polymer replica as an etch resist to transfer the pattern of the replica into a functional material.…”

Section: Imprint Lithographiesmentioning

confidence: 99%

Nanostructures Replicated by Polymer Molding

Love¹,

Wolfe²,

Whitesides³

2004

Dekker Encyclopedia of Nanoscience and Nanotechnology, Second Edition - Six Volume Set (Print Version)

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Using soft lithography to fabricate GaAs/AlGaAs heterostructure field effect transistors

Cited by 62 publications

References 11 publications

Low‐Temperature Fabrication of Efficient Porous Titania Photoelectrodes by Hydrothermal Crystallization at the Solid/Gas Interface

Low‐Temperature Fabrication of Efficient Porous Titania Photoelectrodes by Hydrothermal Crystallization at the Solid/Gas Interface

Nanopatterning Soluble Multifunctional Materials by Unconventional Wet Lithography

Nanostructures Replicated by Polymer Molding

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