2004
DOI: 10.1016/j.bios.2004.02.013
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Utilizing adsorbed proteoliposomes trapped in a non-ruptured state on SiO2 for amplified detection of membrane proteins

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Cited by 13 publications
(11 citation statements)
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“…21,29,35 As vesicles were introduced to the sensor, there was a rapid decrease in the frequency and a simultaneous rapid rise in dissipation. After the vesicles reached a critical coverage, they expelled entrapped water as the vesicle fused and ruptured to form a rigid SPB (loss of water mass to bulk media was indicated by an increase in the frequency; see Figure 3), which was indicated by a decrease in dissipation to <0.2 × 10 -6 (as was typically found for SPB formation on silica 18,19,29,32,34,38 ). After exposure to and subsequent removal of bulk BMIM-Cl, the SPB exhibited no change in the adsorbed mass/frequency of the supported bilayer, indicating that no detectable amount of BMIM + adsorbed to the SPB.…”
Section: Experimental Methodsmentioning
confidence: 96%
“…21,29,35 As vesicles were introduced to the sensor, there was a rapid decrease in the frequency and a simultaneous rapid rise in dissipation. After the vesicles reached a critical coverage, they expelled entrapped water as the vesicle fused and ruptured to form a rigid SPB (loss of water mass to bulk media was indicated by an increase in the frequency; see Figure 3), which was indicated by a decrease in dissipation to <0.2 × 10 -6 (as was typically found for SPB formation on silica 18,19,29,32,34,38 ). After exposure to and subsequent removal of bulk BMIM-Cl, the SPB exhibited no change in the adsorbed mass/frequency of the supported bilayer, indicating that no detectable amount of BMIM + adsorbed to the SPB.…”
Section: Experimental Methodsmentioning
confidence: 96%
“…Gold substrate was used as the IR-reflecting material in this study. There are several reports on the deposition of thin silica films on gold. ,, The main drawback of these methods is the instability of the silica film if directly deposited on gold. We have recently found that thin layers of SiO 2 can be deposited on gold films with no intervening adhesion layer using plasma enhanced chemical vapor deposition (PECVD) technique. The technique is based on the decomposition of a mixture of silane gas (SiH 4 ) and nitrous oxide (N 2 O) near the substrate surface, enhanced by the use of a vapor containing electrically charged particles or plasma at 300 °C.…”
Section: Introductionmentioning
confidence: 99%
“…However, the authors did not comment on the type of bonding between the gold surface and the silane multilayer. The group of Granéli and Kasemo reported that by depositing 1 nm of titanium between the gold and the silicon dioxide layer (30 nm in the case of a SPR chip) stable films could be formed, and the formation of supported phospholipid layers was investigated using a quartz crystal microbalance and SPR. In this case, a 1 nm adhesion layer of titanium was deposited on the top of the gold surface and the silicon dioxide film was deposited using electron-beam evaporation.…”
Section: Introductionmentioning
confidence: 99%