2017
DOI: 10.1007/s10971-017-4457-1
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UV-assisted low-temperature sol–gel deposition of Pb(Zr0.4Ti0.6)O3 film and its photoelectrical properties

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Cited by 14 publications
(7 citation statements)
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“…1). [56] The group of Prof. Trolier-McKinstry (female) fabricated Bi 3 NbO 7 (BNO) ferroelectric thin films by the deposition of solutions made by a modified Pechini's method, [127] irradiation with an UV lamp of 260 nm and annealing on hot plate at 450 C (see Fig. 1).…”
Section: Iii10 Uv Excimer Lampsmentioning
confidence: 99%
See 1 more Smart Citation
“…1). [56] The group of Prof. Trolier-McKinstry (female) fabricated Bi 3 NbO 7 (BNO) ferroelectric thin films by the deposition of solutions made by a modified Pechini's method, [127] irradiation with an UV lamp of 260 nm and annealing on hot plate at 450 C (see Fig. 1).…”
Section: Iii10 Uv Excimer Lampsmentioning
confidence: 99%
“…1). [11,12,14,39,40,44,46, Fukushima et al, [74] and Budd et al, [75,76] were among the first that demonstrated the successful fabrication of ferroelectric oxide thin films (PbTiO 3 , Pb(Zr,Ti)O 3 , PZT and 2014 [39] 2010 [46] 2019 [40] 2017 [44] 2017 [73] 2015 [72] 2014 [11] 2020 [71] 2011 [63][64][65] 2014 [62] 2008 [68] 2010 [67] 1999 [61] 2020 [70] 2003 [69] 2004 [12] 2000 [66] 2014 [62] 2016 [58] 2008 [57] 2017 [56] 2008 [14] 2001 [60] 2013 [59] 2018 [52] 2003 [53] 2000 [54] 2009 [55] The graphic shows the ferroelectric composition of the film, the processing temperature at which they were processed and the ferroelectric remanent polarization (PR) measured in them. The CSD strategy/ies used for the low-temperature solution processing of the films are also shown.…”
Section: Introductionmentioning
confidence: 99%
“…Piezoelectric ceramic materials have been used in various applications, such as sensors, actuators, nonvolatile ferroelectric memory devices, microelectromechanical systems (MEMS), and nanogenerators (NGs) [42][43][44][45].…”
Section: Piezoelectric Materialsmentioning
confidence: 99%
“…The P r , E c , and leakage current of the PZT film were 23.6 μC/ cm 2 , 109.6 kV/cm ( Figure 6(b)), and 10 −6 A/cm 2 , respectively [15]. Similarly, ferroelectric PZT films were fabricated on LaNiO 3 electrode at a low temperature of 450-480°C by a method assisted with UV irradiation [32]. The obtained film annealed at 480°C showed a P r of 21 μC/ cm 2 and leakage current of 9.71 × 10 −8 A/cm 2 at 100 kV/cm, with good retention and high stability of photocurrent.…”
Section: Ultraviolet-assisted Annealingmentioning
confidence: 99%