2016
DOI: 10.1002/pi.5065
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UV-curable positive photoresists for screen printing plate

Abstract: One of the most interesting application areas of screen printing is the production of microelectronic devices. Although negative photoresists are commonly used for the screen printing plate, their resolution limit is about 30 m. A higher resolution of resist patterns on the screen plate is essential for microelectronic device applications. This paper describes the novel design of a UV-curable positive photoresist and its application to the screen printing plate. Positive patterns on the screen plate were obtai… Show more

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Cited by 15 publications
(6 citation statements)
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“…Photopolymerization is a well-established processing technique in the fields of protective and decorative coatings for wood, cardboard, paper, plastic, metal, or ceramics, but it has recently gained popularity in more advanced areas, such as microelectronics, , optical materials, biomedical applications, , and 3D-printing . As photopolymerization has progressed in the past decades, researchers are dealing with a number of different analytical techniques when performing kinetic studies on a UV-curable coating .…”
Section: Introductionmentioning
confidence: 99%
“…Photopolymerization is a well-established processing technique in the fields of protective and decorative coatings for wood, cardboard, paper, plastic, metal, or ceramics, but it has recently gained popularity in more advanced areas, such as microelectronics, , optical materials, biomedical applications, , and 3D-printing . As photopolymerization has progressed in the past decades, researchers are dealing with a number of different analytical techniques when performing kinetic studies on a UV-curable coating .…”
Section: Introductionmentioning
confidence: 99%
“…The pencil hardness of printed patterns was evaluated according to ASTM D3359 [ 49 ]. The hardness of the printed pattern was measured by the trolley method.…”
Section: Resultsmentioning
confidence: 99%
“…In that case, under irradiation, exposed regions of photosensitive material are removed during development. Typically, positive resists consist of a polymer matrix with protected functionalities, small molecular photoactive generator, solvent, and other additives [134,135]. One of the most Figure 8: Structural formula of polydimethylsiloxane oligomer (PDMS).…”
Section: Common Photopolymersmentioning
confidence: 99%
“…Generally, polymers having tertiary carboxylate, tertiary carbonate, tertiary ether, acetal, hemiacetal ester, or other easily protonizable group are used in positive tone resist systems. In that case, after the photoactivated acid-catalyzed reactions, such polymers are decomposed into poly-carboxylic acids or poly-phenols [134], depending on the initial functional group, and the smaller molecular weight having nonpolymeric compounds. Thereafter, polymers having acidic functional groups can easily dissolve in an alkaline solvent.…”
mentioning
confidence: 99%