2021
DOI: 10.1016/j.jphotochem.2021.113162
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UV/H2O2 oxidation of chloronitrobenzenes in waters revisited: Hydroxyl radical induced self-nitration

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Cited by 10 publications
(3 citation statements)
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“…• production has previously been reported in the oxidation of nitroaromatic compounds by HO • attack [66]. These hydroxylated products undergo ring-opening reactions under further attack of HO • to form oxygen-containing aliphatic compounds, which are eventually mineralized into H 2 O and CO 2 [67].…”
Section: Transformation Mechanisms and Pathwaysmentioning
confidence: 89%
“…• production has previously been reported in the oxidation of nitroaromatic compounds by HO • attack [66]. These hydroxylated products undergo ring-opening reactions under further attack of HO • to form oxygen-containing aliphatic compounds, which are eventually mineralized into H 2 O and CO 2 [67].…”
Section: Transformation Mechanisms and Pathwaysmentioning
confidence: 89%
“…For example, nitrophenols are a source of NO 2 − and HONO in sunlight-irradiated aerosols, 47 and chloronitrobenzene released ˙NO 2 when irradiated by 254 nm light in the presence of H 2 O 2 . 48 The formation of NO 2 − has also been demonstrated to occur when N-nitroso precursors, such as the pesticide imidacloprid, undergo direct photolysis. 49 Pesticide concentrations are typically too low for their photolysis to contribute significantly to inorganic nitrogen concentrations in surface waters, but this pathway may be relevant for N-nitroso precursors in DOM.…”
Section: Rns In Sunlit Watersmentioning
confidence: 99%
“…For instance, irradiation with a LPUV lamp induced the release of ˙NO 2 from an organic precursor, chloronitrobenzene, and the resulting ˙NO 2 further reacted with the parent compound to form dinitrochlorobenzene. 48 The contribution of ˙NO 2 from trace organic contaminants is likely minor, but nitroaromatic precursors in DOM may contribute significantly to RNS formation in UV-based treatment systems.…”
Section: Rns In Uv-based Water Treatment Processesmentioning
confidence: 99%