UV light-initiated RAFT polymerization induced self-assembly

Liu, Zhenzhong; Zhang, Gongjun; Wei, Lu; Huang, Youju; Zhang, Jiawei; Chen, Tao

doi:10.1039/c5py00907c

Cited by 35 publications

(42 citation statements)

References 30 publications

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“…Photoinitiators can also be used in PISA under appropriate irradiation conditions using UV or visible light . Original and efficient photoinitiating systems based on horseradish peroxidase have also been successfully developed in combination with hydrogen peroxide and ascorbic acid .…”

Section: The Pisa Processmentioning

confidence: 99%

RAFT‐Mediated Polymerization‐Induced Self‐Assembly

2020

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After a brief history that positions polymerization‐induced self‐assembly (PISA) in the field of polymer chemistry, this Review will cover the fundamentals of the PISA mechanism. Furthermore, this Review will also give an overview of some of the features and limitations of RAFT‐mediated PISA in terms of the choice of the components involved, the nature of the nanoobjects that can be obtained and how the syntheses can be controlled, as well as some potential applications.

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Section: The Pisa Processmentioning

confidence: 99%

RAFT‐Mediated Polymerization‐Induced Self‐Assembly

2020

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“…In their pioneering study, Cai et al photopolymerized diacetone acrylamide in water at room temperature using a well-defined poly(2-hydropropymethacrylamide) macromolecular macro-CTA to produce spherical micelles (λ > 400 nm). Shortly afterwards, Chen et al described a similar methodology relying on the chain extension of a poly(4-vinylpyridine) macroCTA RAFT agent with styrene in methanol under UV radiation (λ = 365 nm) [202]. These two pioneering studies marked the beginning of a continuing series highlighting visible radiationmediated RAFT dispersion PISA.…”

Section: Adaptation To Photoinitiationmentioning

confidence: 99%

Photopolymerization in dispersed systems

Jasinski

Zetterlund

Braun

et al. 2018

Progress in Polymer Science

134

115

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Zero-VOC technologies combining ecological and economic efficiency are destined to occupy a growing place in the polymer economy. Today, Polymerization in dispersed systems and Photopolymerization are the two major key players. The hybrid technology based on photopolymerization in dispersed systems has emerged as the next technological frontier, not only to make processes even more efficient and eco-friendly, but also to expand the range of polymer products and properties. This review summarizes the current knowledge in research relevant to this field in an exhaustive way. Firstly, fundamentals of photoinitiated polymerization in dispersed systems are given to show the favourable context for developing this emerging technology, its specific features as well as the distinctive equipment and materials necessary for its implementation. Secondly, a state-of-the-art and critical review is provided according to the seven main processing methods in dispersed systems: emulsion, microemulsion, miniemulsion, dispersion, precipitation, suspension, and aerosol.

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“…PISA is theoretically suitable for all reversible-deactivation radical polymerization (RDRP) such as atom transfer radical polymerization (ATRP), reversible addition-fragmentation chain transfer (RAFT) polymerization and iodine transfer radical polymerization (ITP) [7,[14][15][16][17]. However, the more in-depth study of PISA is currently carried out by RAFT polymerization due to the absence of transition metal during PISA process [7,[18][19][20][21].…”

Section: Introductionmentioning

confidence: 99%

One-Step Photocontrolled Polymerization-Induced Self-Assembly (Photo-PISA) by Using In Situ Bromine-Iodine Transformation Reversible-Deactivation Radical Polymerization

et al. 2020

Polymers

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Polymerization-induced self-assembly (PISA) has become an effective strategy to synthesize high solid content polymeric nanoparticles with various morphologies in situ. In this work, one-step PISA was achieved by in situ photocontrolled bromine-iodine transformation reversible-deactivation radical polymerization (hereinafter referred to as Photo-BIT-RDRP). The water-soluble macroinitiator precursor α-bromophenylacetate polyethylene glycol monomethyl ether ester (mPEG1k-BPA) was synthesized in advance, and then the polymer nanomicelles (mPEG1k-b-PBnMA and mPEG1k-b-PHPMA, where BnMA means benzyl methacrylate and HPMA is hydroxypropyl methacrylate) were successfully formed from a PISA process of hydrophobic monomer of BnMA or HPMA under irradiation with blue LED light at room temperature. In addition, the typical living features of the photocontrolled PISA process were confirmed by the linear increase of molecular weights of the resultant amphiphilic block copolymers with monomer conversions and narrow molecular weight distributions (Mw/Mn < 1.20). Importantly, the photocontrolled PISA process is realized by only one-step method by using in situ photo-BIT-RDRP, which avoids the use of transition metal catalysts in the traditional ATRP system, and simplifies the synthesis steps of nanomicelles. This strategy provides a promising pathway to solve the problem of active chain end (C-I) functionality loss in two-step polymerization of BIT-RDRP.

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UV light-initiated RAFT polymerization induced self-assembly

Abstract: TOCReversible addition-fragmentation chain transfer (RAFT) polymerization induced self-assembly (PISA) initiated by UV light as a new strategy is exploited to prepare polymeric nanomicelles at room temperature.

Cited by 35 publications

References 30 publications

RAFT‐Mediated Polymerization‐Induced Self‐Assembly

RAFT‐Mediated Polymerization‐Induced Self‐Assembly

Photopolymerization in dispersed systems

One-Step Photocontrolled Polymerization-Induced Self-Assembly (Photo-PISA) by Using In Situ Bromine-Iodine Transformation Reversible-Deactivation Radical Polymerization

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