2019
DOI: 10.1016/j.materresbull.2019.05.013
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UV–vis transparent conducting Ta-doped SnO2 epitaxial films grown by metal-organic chemical vapor deposition

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Cited by 18 publications
(8 citation statements)
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“…Mobility and carrier concentration also gained considerably high values at 11.85 cm 2 V -1 s -1 and 2:26 Â 10 20 cm À3 , as compared with those of other synthesised samples. These values of electrical properties are comparable to those of doped SnO 2 coatings reported in the literature [41,63,64]. Additionally, the continuous layers occurring in the SEM images of 2.4 at% Mo-doped thin films (see Fig.…”
Section: Electrical Properties Of Thin Filmssupporting
confidence: 88%
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“…Mobility and carrier concentration also gained considerably high values at 11.85 cm 2 V -1 s -1 and 2:26 Â 10 20 cm À3 , as compared with those of other synthesised samples. These values of electrical properties are comparable to those of doped SnO 2 coatings reported in the literature [41,63,64]. Additionally, the continuous layers occurring in the SEM images of 2.4 at% Mo-doped thin films (see Fig.…”
Section: Electrical Properties Of Thin Filmssupporting
confidence: 88%
“…The Mo doping did not induce the expansion of bandgap in SnO 2 thin films, i.e. the Moss-Burstein effect (shift of band gap to higher values owing to higher levels of the conduction band being occupied by extra electrons), as usually observed in other doped SnO 2 systems [64,69]. It is likely due to the limited replacement by Mo 6? for Sn 4? in SnO 2 unit cells; therefore, finite higher levels in the conductions band were filled with electrons provided by doping ions.…”
Section: Optical Properties Of Thin Films From Absorption Spectral Datamentioning
confidence: 70%
“…The measured direct bandgaps increase with Tadoping, from 3.96 eV for the undoped SnO 2 to 4.24 eV for the 2 mol% Ta-doped SnO 2 films. The increase of bandgap is attributed to the effect of electron doping that shifts the Fermi level into the CB, i.e., the Burstein-Moss effect as reported previously [27,31,32]. Subsequently, the performance of the 2 mol% TTO has been compared with other n-type TCO thin films grown by a solution-based spin-coating method (Table 2), and the records indicate a significant potential of the deposited TTO film for optoelectronic applications.…”
Section: Electrical and Optical Properties Of The Tto Thin Filmsmentioning
confidence: 53%
“…The crystallite size values were estimated for each deposited film with reference to Gaussian-fit (110) peak by using the Debye-Scherrer relation, D = 0.9λ/βcosθ, where λ, β, and θ are the wavelength of X-rays (λ = 1.54056 Å), full-width at half-maximum (FWHM) and Bragg's diffraction angle of the higher intense diffraction (110) peak in radians, respectively [29]. The decrease of crystallite sizes with Ta-doping results in the change of crystallographic ordering as the smaller Ta 5+ cations substitute the larger Sn 4+ cations in the SnO 2 matrix [30][31][32]. Furthermore, these TTO thin films display granular morphology with a crystallite size of 20.0 nm, and the thickness is uniformly controlled to about 400 nm as observed on SEM (Fig.…”
Section: Crystal Structure and Morphology Of The Thin Filmsmentioning
confidence: 99%
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