2007
DOI: 10.1063/1.2764245
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V O 2 films with strong semiconductor to metal phase transition prepared by the precursor oxidation process

Abstract: We describe a relatively simple, reliable, and reproducible preparation technique, the precursor oxidation process, for making VO 2 films with strong semiconductor-to-metal phase transition. Sputter-deposited metal precursor V films were oxidized in situ in the deposition chamber for 2.5-7 h at 370-415°C in 0.2 Torr O 2 to form 22-220 nm VO 2. The strength ͓resistivity ratio, RR= S / M ͔ and sharpness ͑hysteresis width ⌬T C ͒ of T-dependent semiconductor-to-metal hysteretic phase transition in VO 2 were our mo… Show more

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Cited by 97 publications
(62 citation statements)
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“…37,57,58 Depending on the film quality, the conductivity increases by 3 -4 orders of magnitude when heating the samples above the MIT temperature. Adopting a resistivity of 1 cm for VO 2 at room temperature and 1 m cm at …”
Section: Resultsmentioning
confidence: 99%
“…37,57,58 Depending on the film quality, the conductivity increases by 3 -4 orders of magnitude when heating the samples above the MIT temperature. Adopting a resistivity of 1 cm for VO 2 at room temperature and 1 m cm at …”
Section: Resultsmentioning
confidence: 99%
“…120 From a practical point of view, VO 2 may be awkward to prepare since the vanadium ions are in states with intermediate oxidation and it may be more facile to fabricate materials under nonoxidizing ͑metallic V͒ or fully oxidizing ͑in-sulating V 2 O 5 ͒ conditions. The limitations are not as stringent as they may seem, though, and it should be observed that metallic vanadium can be transformed to VO 2 by controlled oxidation [121][122][123][124] and that insulating V 2 O 5 van be transformed to VO 2 by controlled reduction in films. [125][126][127] There is a tendency that limited dimensions decreases c and widens the hysteresis in nanocrystalline films 46,48,[128][129][130][131][132][133][134][135] and nanorods.…”
Section: Discussionmentioning
confidence: 99%
“…We are interested in this system because of distinct differences in their chemical and physical properties: TiO 2 without d electrons is a wide band-gap insulator and shows a photocatalytic activity, 14,15 while VO 2 with one d electron is a metal at high temperatures and becomes an insulator at low temperatures; a metal-insulator (MI) transition takes place at T MI = 342 K upon heating. 16 VO 2 is potentially important for applications as ultrafast resistive or optical switching devices, 17,18 because conductivity and optical absorption change dramatically across the transition. These large differences in properties between the two constituents make the TiO 2 -VO 2 system exceptional; in other SD systems, two constituents possess quite similar properties in all aspects.…”
Section: 11mentioning
confidence: 99%