2020
DOI: 10.1016/j.matlet.2020.128368
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Vacuum annealing level evolution of titania thin films: Functionality as potential optical window in solar cells

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Cited by 14 publications
(2 citation statements)
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“…The electron beam evaporation technique has the advantage of higher deposition rate and lower impurity level and is broadly used as a thin film coating method for the deposition of Ti or Ti:X films onto indium tin oxide [ 33 , 34 , 35 ]. Krysa et al [ 33 ] reported that films prepared by using electron beam evaporation have poor adhesion to the TCO, as compared to films deposited by magnetron sputtering.…”
Section: Description Of Deposition Techniques Of Tco-ti: Metal Thin F...mentioning
confidence: 99%
“…The electron beam evaporation technique has the advantage of higher deposition rate and lower impurity level and is broadly used as a thin film coating method for the deposition of Ti or Ti:X films onto indium tin oxide [ 33 , 34 , 35 ]. Krysa et al [ 33 ] reported that films prepared by using electron beam evaporation have poor adhesion to the TCO, as compared to films deposited by magnetron sputtering.…”
Section: Description Of Deposition Techniques Of Tco-ti: Metal Thin F...mentioning
confidence: 99%
“…We note that the spectra of these two samples showed a remarkable interference behavior explained by the multiple constructive reflections which may verified the thickness uniformity of the films. The high transmission rate may be due to the low scattering on the surface, which confirms the low roughness of the surface, this character is considered important for the performance of the photovoltaic device [40] [ [11].…”
Section: Optical Characterizationmentioning
confidence: 99%