2012
DOI: 10.1021/nl204562j
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van der Waals Epitaxy of MoS2 Layers Using Graphene As Growth Templates

Abstract: We present a method for synthesizing MoS(2)/Graphene hybrid heterostructures with a growth template of graphene-covered Cu foil. Compared to other recent reports, (1, 2) a much lower growth temperature of 400 °C is required for this procedure. The chemical vapor deposition of MoS(2) on the graphene surface gives rise to single crystalline hexagonal flakes with a typical lateral size ranging from several hundred nanometers to several micrometers. The precursor (ammonium thiomolybdate) together with solvent was… Show more

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Cited by 936 publications
(733 citation statements)
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“…25). At the Γ-point, the bandgap transition is indirect for the bulk material, but gradually shifts to be direct for the monolayer 24,[73][74][75][76][77] . The direct excitonic transitions at the K-point remain relatively unchanged with layer number 32 .…”
Section: Electronic Structurementioning
confidence: 99%
See 1 more Smart Citation
“…25). At the Γ-point, the bandgap transition is indirect for the bulk material, but gradually shifts to be direct for the monolayer 24,[73][74][75][76][77] . The direct excitonic transitions at the K-point remain relatively unchanged with layer number 32 .…”
Section: Electronic Structurementioning
confidence: 99%
“…In many of these methods, the final MoS 2 film thickness is dependent on the concentration or thickness of the initial precursor, although precise control of the number of layers over a large area has not yet been achieved. CVD growth of MoS 2 has also been demonstrated using previously CVD-grown graphene on Cu foil as a surface template, resulting in single-crystal flakes of MoS 2 several micrometres in lateral size 75 . These CVD reports are still relatively early results but hold promise that further work will lead to growth of materials other than MoS 2 , and production of uniform, large-area sheets of TMDCs with controllable layer number.…”
mentioning
confidence: 99%
“…Furthermore, for many applications, it is vital to manufacture high-quality epitaxial films with controllable methods such as chemical vapour deposition (CVD) or molecular beam epitaxy (MBE) 20,21 .…”
mentioning
confidence: 99%
“…Moreover, we find rather large spin-splitting (~180 meV) at the valence band maximum (VBM) of the monolayer Figure 1b shows the reflection high-energy electron diffraction (RHEED) pattern of our substrate of epitaxial bilayer graphene-terminated 6H-SiC(0001) 22 . The similar layered structure and chemically inert surface of graphene make it a perfect substrate for van der Waals epitaxial growth of two-dimensional layered materials 21,23,24 . We have successfully grown high-quality singlecrystal MoSe 2 films of large size (~5 mm× 2 mm), from monolayer up to 8 ML, with layer-by-layer control of thickness, by delicate control of the growth conditions.…”
mentioning
confidence: 99%
“…For vertical heterostructures in particular, layer-by-layer growth allows direct control of the constituent materials in a serial fashion, and typically these techniques can be scaled to large lateral dimensions in a way that is not possible with exfoliated materials. Hence, a great deal of e ort has gone into adapting epitaxial growth methods to form atomic layers of MoS 2 , MoSe 2 , WSe 2 , h-BN, and others on graphene, [50,52,68,75,76] as well as graphene on h-BN. [77,78] Graphene itself has been formed in large-area lms using CVD on metal foils with varying degrees of quality.…”
Section: Introductionmentioning
confidence: 99%