Vapor deposition routes to conformal polymer thin films

Moni, Priya; Al-Obeidi, Ahmed; Gleason, Karen K.

doi:10.3762/bjnano.8.76

Cited by 60 publications

(52 citation statements)

References 51 publications

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“…The iCVD reaction mechanism is initiated by pyrolysis of the initiator to radicalize non-covalent electrons to bond with the vinyl group of the monomer and to grow the polymer thin film through the sequential chain bonding [25,26]. Notably, the initiator TBPO is radicalized through the pyrolysis and polymerized with the vinyl groups of monomers such as V4D4 and PFDMA, resulting in thin film growth.…”

Section: Icvd Process Basicsmentioning

confidence: 99%

Fabrication of a Conjugated Fluoropolymer Film Using One-Step iCVD Process and its Mechanical Durability

Lee¹,

Kim

Lee

et al. 2019

Coatings

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Most superhydrophobic surface fabrication techniques involve precise manufacturing process. We suggest initiated chemical vapor deposition (iCVD) as a novel CVD method to fabricate sufficiently durable superhydrophobic coating layers. The proposed method proceeds with the coating process at mild temperature (40 °C) with no need of pretreatment of the substrate surface; the pressure and temperature are optimized as process parameters. To obtain a durable superhydrophobic film, two polymeric layers are conjugated in a sequential deposition process. Specifically, 1,3,5,7-tetravinyl-1,3,5,7-tetramethylcyclotetrasiloxane (V4D4) monomer is introduced to form an organosilicon layer (pV4D4) followed by fluoropolymer formation by introducing 1H, 1H, 2H, 2H-Perfluorodecyl methacrylate (PFDMA). There is a high probability of covalent bond formation at the interface between the two layers. Accordingly, the mechanical durability of the conjugated fluoropolymer film (pV4D4-PFDMA) is reinforced because of cross-linking. The superhydrophobic coating on soft substrates, such as tissue paper and cotton fabric, was successfully demonstrated, and its durability was assessed against the mechanical stress such as tensile loading and abrasion. The results from both tests confirm the improvement of mechanical durability of the obtained film.

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Section: Icvd Process Basicsmentioning

confidence: 99%

Fabrication of a Conjugated Fluoropolymer Film Using One-Step iCVD Process and its Mechanical Durability

Lee¹,

Kim

Lee

et al. 2019

Coatings

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“…The deposited film is flexible and can endure a tensile strain of up to 3% and repeated flexing cycles without generating cracks or delamination, rendering the iCVD process suitable for applications in flexible devices. The iCVD polymer film can generate an intact interface with an inorganic barrier layer by filling the nano‐defects and nano‐pores of inorganic layers …”

Section: Icvd For Electronic Devicesmentioning

confidence: 99%

Initiated Chemical Vapor Deposition: A Versatile Tool for Various Device Applications

et al. 2017

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Advances in device technology have been accompanied by the development of new types of materials and device fabrication methods. Considering device design, initiated chemical vapor deposition (iCVD) inspires innovation as a platform technology that extends the application range of a material or device. iCVD serves as a versatile tool for surface modification using functional thin film. The building of polymeric thin films from vapor phase monomers is highly desirable for the surface modification of thermally sensitive substrates. The precise control of thin film thicknesses can be achieved using iCVD, creating a conformal coating on nano-, and microstructured substrates such as membranes and microfluidics. iCVD allows for the deposition of polymer thin films of high chemical functionality, and thus, substrate surfaces can be functionalized directly from the iCVD polymer film or can selectively gain functionality through chemical reactions between functional groups on the substrate and other reactive molecules. These beneficial aspects of iCVD can spur breakthroughs in device fabrication based on the deposition of robust and functional polymer thin films. This review describes significant implications of and recent progress made in iCVD-based technologies in three fields: electronic devices, surface engineering, and biomedical applications.

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“…As mentioned in the previous section, the possibility to conformally coat complex tridimensional geometries allows the engineering of more advanced drug delivery systems. iCVD has been demonstrated to achieve highly controlled and conformal layers, coating complex 3D geometries . McInnes et al adopted iCVD deposited pH responsive polymers for the encapsulation of nanoporous drug delivery vehicles, that is, drug loaded porous silicon (pSi).…”

Section: Strategies For Drug Encapsulation and Controlled Deliverymentioning

confidence: 99%

Strategies for Drug Encapsulation and Controlled Delivery Based on Vapor‐Phase Deposited Thin Films

2017

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Vapor-phase deposition methods allow the synthesis and engineering of organic and inorganic thin films, with high control on the chemical composition, physical properties, and conformality. In this review, the recent applications of vapor-phase deposition methods such as initiated chemical vapor deposition (iCVD), plasma enhanced chemical vapor deposition (PE-CVD), and atomic layer deposition (ALD), for the encapsulation of active pharmaceutical drugs are reported. The strategies and emergent routes for the application of vapor-deposited thin films on the drug controlled release and for the engineering of advanced release nanostructured devices are presented.

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Vapor deposition routes to conformal polymer thin films

Cited by 60 publications

References 51 publications

Fabrication of a Conjugated Fluoropolymer Film Using One-Step iCVD Process and its Mechanical Durability

Fabrication of a Conjugated Fluoropolymer Film Using One-Step iCVD Process and its Mechanical Durability

Initiated Chemical Vapor Deposition: A Versatile Tool for Various Device Applications

Strategies for Drug Encapsulation and Controlled Delivery Based on Vapor‐Phase Deposited Thin Films

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