2015
DOI: 10.1016/j.microrel.2014.11.011
|View full text |Cite
|
Sign up to set email alerts
|

Variability and reliability analysis of CNFET technology: Impact of manufacturing imperfections

Abstract: Carbon nanotube field-effect transistors (CNFETs) are promising candidates to substitute silicon transistors. Boasting extraordinary electronic properties, CNFETs exhibit characteristics rivaling those of state-of-the-art Si-based metal-oxide-semiconductor field-effect transistors (MOSFETs). However, as any technology that is in development, CNFET fabrication process still have some imperfections that results in carbon nanotube variations, which can have a severe impact on the devices' performance and jeopardi… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
28
0

Year Published

2019
2019
2024
2024

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 28 publications
(28 citation statements)
references
References 36 publications
(44 reference statements)
0
28
0
Order By: Relevance
“…STIs with original transistor sizes in [16] STIs with threshold voltages indicated in [35] STIs with proposed transistor sizes without PV (Fig. In spite of its several great advantages, CNFET is still in development and suffers from imperfect fabrication [50,51]. Some of the manufacturing issues are metallic and misaligned CNTs, chirality drift, CNT doping variations, and density fluctuations [50].…”
Section: Table VI Comparison Of Static Noise Margin Values Designsmentioning
confidence: 99%
See 1 more Smart Citation
“…STIs with original transistor sizes in [16] STIs with threshold voltages indicated in [35] STIs with proposed transistor sizes without PV (Fig. In spite of its several great advantages, CNFET is still in development and suffers from imperfect fabrication [50,51]. Some of the manufacturing issues are metallic and misaligned CNTs, chirality drift, CNT doping variations, and density fluctuations [50].…”
Section: Table VI Comparison Of Static Noise Margin Values Designsmentioning
confidence: 99%
“…In spite of its several great advantages, CNFET is still in development and suffers from imperfect fabrication [50,51]. Some of the manufacturing issues are metallic and misaligned CNTs, chirality drift, CNT doping variations, and density fluctuations [50]. One of the most problematic issues affecting circuit design is that D CNT is subject to 0.04nm to 0.2nm variations [52].…”
Section: Table VI Comparison Of Static Noise Margin Values Designsmentioning
confidence: 99%
“…Variations in CNT diameter and density result in delays and power consumption variation. Additionally, the misalignment of CNTs can lead to incorrect functionality [30].…”
Section: Cntfet-based Gate Failure Modelingmentioning
confidence: 99%
“…Therefore, the space complexity of this process is based on a 9 × 9 JPIM, 9 × 3 PTM, and 9 × 3 IM, which are independent of the number of circuit gates. Consequently, the space complexity of a circuit containing g two-input NAND gates can be calculated according to (30).…”
Section: Reliabilit Y Evaluation Of Combinational Circuitsmentioning
confidence: 99%
“…et al, 2013). Synthesis of CNTs, for example, leads to a mixture of conducting and semiconducting nanoparticles whereas the conductivity of the former depends on doping, diameter, density and chirality (Almudever C.G. and Rubio A., 2015).…”
Section: Electrical Conductivitymentioning
confidence: 99%