2005
DOI: 10.1088/0256-307x/22/5/053
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Variable Energy Positron Annihilation Spectroscopy of GaN Grown on Sapphire Substrates with MOCVD

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Cited by 3 publications
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“…This suggests that larger voids grow after annealing above 500°C. Similar voids were also observed by Fan et al 43 in GaN films implanted with Al + immediately after implantation.…”
Section: Resultssupporting
confidence: 87%
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“…This suggests that larger voids grow after annealing above 500°C. Similar voids were also observed by Fan et al 43 in GaN films implanted with Al + immediately after implantation.…”
Section: Resultssupporting
confidence: 87%
“…For example, S N for monovacancies is 1.030, S N for divacancies is 1.034-1.044, small vacancy clusters are expected to have 1.05-1.07, and for voids S N is 1.10-1.14. 43,44 From Fig. 3, it can be seen that for the unimplanted sample, the S N parameter decreases gradually from the surface state to the bulk state with increasing energy, and becomes constant at E Ͼ 10 keV.…”
Section: Resultsmentioning
confidence: 96%