Varied longitudinal microstructure of μc-Si: H films by tuning substrate temperature

Abstract

Hydrogenated silicon thin films were deposited using plasma enhanced chemical vapour deposition method. The effects of substrate temperature on the microstructure and electrical properties of the films were investigated. Results show that the as received crystalline silicon thin film is a typical two-phase structure consisting of an amorphous phase and a crystalline phase. At a lower substrate temperature, the thickness of the initial amorphous incubation layer is dozens of nanometers, and few crystalline grains inset in the film after phase transition. As the substrate temperature increases, the initial incubation stage shortens to several nanometers, and the phase transition to crystalline starts earlier. After the phase transition, abundant crystallites appear, and the amorphous phase exists in the film just as the grain boundary. However, at overhigh substrate temperature, the average crystallinity and grain size of the film decrease. Deposition rate abidingly decreases with the increase in substrate temperature. The films with more ordered structure exhibit superior electrical properties.

Simulation of Epitaxial Film–Substrate Interaction Potential

“…The crystallinity of the thermoelectric thin film Ag-Sb-Te at room temperature depends on the state of the substrate [38]. The crystalline silicon thin film is a two-phase structure of the amorphous phase and the crystalline phase [39]. The transition temperature from the amorphous phase to the crystalline phase shifts under the influence of the substrate.…”

DLC (H) coated 13Cr SMSS by high-pulsed power CVD technique

“…Furthermore, it offers easily controllable process parameters and various films formed by replacing the introduced gases. For example, SiNx thin films were prepared by introducing SiH 4 , N 2 , and NH 3 [14] and SiO 2 thick films by N 2 O and SiH 4 [15]. Wei et al [16] deposited ultrathick DLC films on the inner wall of a tubular workpiece to achieve hydrophobicity and corrosion resistance to prevent nodulations, and Tian et al [17] deposited ultrathin hydrophobic and optical DLC films on the inner wall of cylindrical PET barrels by this CVD technology.…”