2016
DOI: 10.1515/9783110443257
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Verfassung als Ordnungskonzept

Abstract: Jahrestagung 2015 6 vung einer Hälfte Europas ermöglicht hat, seine Stärke aus der werbenden Kraft der Prinzipien einer rechtsstaatlichen Verfassung bezogen hat. Auch das geht nicht nur Deutschland an, und wen ginge es stärker an als den Verfassungsrechtler?".Am Vorabend der Tagung traf sich der Vorstand der Vereinigung mit allen 15 neu aufgenommenen Mitgliedern sowie deren Mentorinnen und Mentoren. Der Oberbürgermeister der Stadt Speyer, Hansjörg Eger, empfing zusammen mit dem Rektor der Deutschen Universität… Show more

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Cited by 5 publications
(7 citation statements)
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“…Comments: The reductase domain of NOS catalyses the reduction of cytochrome c and other redox-active dyes [322]. NADPH:O 2 oxidoreductase catalyses the formation of superoxide anion/H 2 O 2 in the absence of L-arginine and sapropterin.…”
Section: Enzymes L-arginine Turnover Dimethylarginine Dimethylaminohymentioning
confidence: 99%
“…Comments: The reductase domain of NOS catalyses the reduction of cytochrome c and other redox-active dyes [322]. NADPH:O 2 oxidoreductase catalyses the formation of superoxide anion/H 2 O 2 in the absence of L-arginine and sapropterin.…”
Section: Enzymes L-arginine Turnover Dimethylarginine Dimethylaminohymentioning
confidence: 99%
“…Based on the previous discussion of the pros and cons of MOSFET and TFET 8T SRAM cells and realizing that mixing TFET and MOSFET devices is manufacturally possible since the process of TFET device is compatible with CMOS process [5], Fig. 6 shows the proposed mixed TFET-MOSFET 8T SRAM cell and corresponding read/write paths.…”
Section: Mixed Tfet-mosfet 8t Sram Cellmentioning
confidence: 99%
“…Tunnel FET (TFET) device, with the band-to-band tunneling as the major current transport mechanism, enables steeper than 60mV/dec subthreshold swing and is a promising device to replace MOSFET device for ultra-low voltage/power operation [1]- [5]. However, the asymmetric source/drain design and transport mechanism result in uni-directional current conduction [6], which severely impacts the pass-gate based circuits and SRAMs [6]- [9].…”
Section: Introductionmentioning
confidence: 99%
“…In contrast with the SOI Z-RAM® there is no need of impact ionization to create/inject the hole charge in the device body, the holes being injected by the forward-bias p+i junction, which significantly improves the device reliability. Measurements on FDSOI TFET devices as reported in [1,2] were performed at elevated temperatures and used to calibrate the non-local band-to-band (B2B) tunnelling model in Sentaurus TCAD [3]. The retention characteristics of the proposed memory cell is simulated at an elevated temperature of 85°C and is shown to be not degrading at higher temperature as is the case in conventional capacitorless DRAMs [4].…”
mentioning
confidence: 99%