Versatile digital micromirror device-based method for the recording of multilevel optical diffractive elements in photosensitive chalcogenide layers (AMTIR-1)

Abstract

A new alternative and versatile method for the production of diffractive optical elements (DOEs) with up to four phase levels in AMTIR-1 (Ge₃₃As₁₂Se₅₅) layers is demonstrated. The developed method proposes the use of the photosensitive properties of the layers and a specific in situ optical monitoring coupled with a reverse engineering algorithm to control the trigger points of the writing of the different diffractive patterns. Examples of various volume DOEs are presented.

Direct Laser Writing of Computer-Generated Holograms by Photodissolution of Silver in Arsenic Trisulfide

“…The traditional fabrication methods of CGHs or DOEs rely on photolithographic processes that require several steps and can be time-consuming. In recent works, it has been shown that basic diffractive optical elements could be recorded in chalcogenide layers based on photo-induced refractive index change [2,3]. However, due to limited refractive index change, thick layers, up to 15-25 µm, were required to generate the desired phase change.…”