With
the development of microprocessors toward higher power, larger
chip, and higher frequency, heat dissipation is one of the central
issues. Thermal interface materials (TIMs), which are used between
the chip and the heat spreader and between the heat spreader and the
heat sink, play an increasingly important role in microprocessor cooling.
Currently, most of the research has primarily dealt with understanding
the thermal conductivity of TIMs. For thermal design, elastic compliance
is also important because excellent elastic compliance can reduce
thermal contact resistance and relieve the warpage failure caused
by stress concentration. However, high thermal conductivity and excellent
elastic compliance are usually mutually exclusive in TIMs. Herein,
we report a TIM made from vertically oriented graphite and polybutadiene
that shows high through-plane thermal conductivity of 64.90 W·m–1·K–1, excellent elastic compliance
with only 93 kPa stress at 50% compressive strain similar to soft
biological tissues, and outstanding compression resilience performance
(storage modulus 220 kPa and mechanical loss factor 0.226). These
excellent properties result from the vertical orientation of graphite
films in polybutadiene, strong interfacial strength between graphite
films and polybutadiene, and the minimized negative impact of graphite
on the intrinsic mechanical properties of polybutadiene by means of
cross-stacking techniques. The optimal TIM is applied in CPU microprocessor
cooling and exhibits superior heat dissipation capability, by up to
158 °C reduction of chip temperature comparing with polybutadiene.
This work provides a high-performance TIM to meet specific requirements
for high-performance computing, such as GPU, AI computing, and cloud
computing.