2021
DOI: 10.3390/nano11113137
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Vertically Aligned n-Type Silicon Nanowire Array as a Free-Standing Anode for Lithium-Ion Batteries

Abstract: Due to its high theoretical specific capacity, a silicon anode is one of the candidates for realizing high energy density lithium-ion batteries (LIBs). However, problems related to bulk silicon (e.g., low intrinsic conductivity and massive volume expansion) limit the performance of silicon anodes. In this work, to improve the performance of silicon anodes, a vertically aligned n-type silicon nanowire array (n-SiNW) was fabricated using a well-controlled, top-down nano-machining technique by combining photolith… Show more

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Cited by 27 publications
(39 citation statements)
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“…To solve these problems, great efforts were taken into developing advanced microelectrode manufacturing methods. 54 Several deposition technologies, including physical vapor deposition (PVD), 55 pulsed laser deposition (PLD), 56 chemistry vapor deposition (CVD), 57 and atomic layer deposition (ALD), [57][58][59] have been adopted to fabricate micro-LIBs with laminated thin film structure. Among them, ALD is an effective method to manufacture high quality thin-film electrodes.…”
Section: Laminated Thin Film Structurementioning
confidence: 99%
“…To solve these problems, great efforts were taken into developing advanced microelectrode manufacturing methods. 54 Several deposition technologies, including physical vapor deposition (PVD), 55 pulsed laser deposition (PLD), 56 chemistry vapor deposition (CVD), 57 and atomic layer deposition (ALD), [57][58][59] have been adopted to fabricate micro-LIBs with laminated thin film structure. Among them, ALD is an effective method to manufacture high quality thin-film electrodes.…”
Section: Laminated Thin Film Structurementioning
confidence: 99%
“…1c that the silicon nanowires boast coulombic efficiency as high as 99.5% during 100 cycles of charge and discharge at 0.06mAꞏcm-2 and discharge capacity retaining 85.9% after the first cycle after pre-lithiation process. [6] The fabricating process is shown in Fig. 1a First they employ photolithography to create a photoresist thin film on silicon substrate(Fig.…”
Section: Construction Of Better Morphology Of Silicon Nanowiresmentioning
confidence: 99%
“…Figure1. The (a) fabrication process (b) morphology (c) cycle performance coulombic of vertical silicon nanowires fabricated by RIE-ICP (d) silicon nanowires fabricated with different mask materials [6][7]. RIE-ICP is a novel method used to fabricate vertically arrayed silicon nanowires.…”
mentioning
confidence: 99%
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“…There are several publications reporting the performances of SiNW electrodes, [26][27][28] and notably, two review articles. 29,30 However, the reviews simply summarized the forms of SiNW electrodes and their electrochemical performances, without a critical assessment of the data.…”
Section: Introductionmentioning
confidence: 99%