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Bouneau, S.; Brunelle, Alain; Della‐Negra, S.; Depauw, J.; Jacquet, D.; Beyec, Y. Le; Pautrat, M.; Fallavier, M.; Poizat, Jean-Claude; Andersen, H. H.

doi:10.1103/physrevb.65.144106

Cited by 147 publications

(82 citation statements)

References 27 publications

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“…(2), the total sputtering yield is found to increase by factors of 4.9 and 10.1 upon switching from mono-to di-and from mono-to triatomic projectiles, respectively. These values compare well with recently measured sputtering yield data for polycrystalline gold and silver targets under bombardment with Au À m projectiles [20,21], where the yield was found to scale with projectile nuclearity as m 2 thus leading to yield enhancement factors of 4 and 9 for m ¼ 2 and 3, respectively. More specifically, if the silver yield data of [21], which have been measured at higher impact energies than employed here, are extrapolated down to 7 keV/atom, one finds enhancement factors of 5 and 10.5 which are in very good agreement with those determined here.…”

Section: Resultssupporting

confidence: 87%

“…These values compare well with recently measured sputtering yield data for polycrystalline gold and silver targets under bombardment with Au À m projectiles [20,21], where the yield was found to scale with projectile nuclearity as m 2 thus leading to yield enhancement factors of 4 and 9 for m ¼ 2 and 3, respectively. More specifically, if the silver yield data of [21], which have been measured at higher impact energies than employed here, are extrapolated down to 7 keV/atom, one finds enhancement factors of 5 and 10.5 which are in very good agreement with those determined here. Moreover, somewhat older published yield data for polycrystalline silver under bombardment with Sb þ m projectiles [22], again extrapolated down to 7 keV/ atom, yield enhancement factors of 4.8 and 14.4, which again compare well with the self-sputtering data determined here.…”

Section: Resultssupporting

confidence: 87%

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Projectile size effects on cluster formation in sputtering

Heinrich

Wucher

2003

Nuclear Instruments and Methods in Physics Research Section B:

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We have investigated the formation of neutral clusters during self-sputtering of a silver surface under bombardment with Ag þ m projectile ions (m ¼ 1, 2, 3). Particular emphasis was put on the size distribution of the sputtered clusters and its dependence on the projectile nuclearity m under conditions of constant impact velocity. It is found that the relative abundance of larger clusters increases from mono-to diatomic but decreases again from di-to triatomic projectiles. At the same time, the total sputtering yield exhibits a strong non-linear increase in both cases. This finding breaks the unique correlation between cluster abundance pattern and sputtering yield that has been observed many times in the past. The results indicate that the nature of the cluster formation process in sputtering must change at large sputtering yields connected with polyatomic projectile impact.

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Section: Resultssupporting

confidence: 87%

Section: Resultssupporting

confidence: 87%

Projectile size effects on cluster formation in sputtering

Heinrich

Wucher

2003

Nuclear Instruments and Methods in Physics Research Section B:

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“…Heat spikes can lead to massive sputtering yields by a combination of evaporation and flow of liquid material from the heat spike. 68,120 Low-energy can also sputter material at energies below the physical sputtering threshold via bond-weakening and breaking mechanisms. 121 Well-described examples of this are the so called Küppers cycle, in which ion bombardment weakens chemical bonds so that molecules can then desorb thermally 122 and swift chemical sputtering, in which hydrogen isotopes with energies of the order of 10 eV can break bonds athermally by entering between two atoms.…”

Section: A Production Of Defects In Bulk Targetsmentioning

confidence: 99%

Ion and electron irradiation-induced effects in nanostructured materials

Krasheninnikov¹,

Nordlund²

2010

Journal of Applied Physics

946

591

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A common misconception is that the irradiation of solids with energetic electrons and ions has exclusively detrimental effects on the properties of target materials. In addition to the well-known cases of doping of bulk semiconductors and ion beam nitriding of steels, recent experiments show that irradiation can also have beneficial effects on nanostructured systems. Electron or ion beams may serve as tools to synthesize nanoclusters and nanowires, change their morphology in a controllable manner, and tailor their mechanical, electronic, and even magnetic properties. Harnessing irradiation as a tool for modifying material properties at the nanoscale requires having the full microscopic picture of defect production and annealing in nanotargets. In this article, we review recent progress in the understanding of effects of irradiation on various zero-dimensional and one-dimensional nanoscale systems, such as semiconductor and metal nanoclusters and nanowires, nanotubes, and fullerenes. We also consider the two-dimensional nanosystem graphene due to its similarity with carbon nanotubes. We dwell on both theoretical and experimental results and discuss at length not only the physics behind irradiation effects in nanostructures but also the technical applicability of irradiation for the engineering of nanosystems.

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“…Using the semi-empirical theory, Seah [11] showed that for gold using 16 and 64 keV Au primary ions, the predicted yields were 13 and 20 but that, if the theory were extended to include the thermal spike approach of Sigmund and Claussen [12], the values increased to 17 and 40, respectively. Seah's [11] full calculations described the experimental data of Bouneau et al [13] with a standard deviation of 17% for primary ion energies up to 2800 keV, with primary ion clusters up to Au 13 + and yields up to 14313. It is clear that the molecular dynamics simulations, at least for the flat surface, were generating yields that were a factor of 16 ± 3 times too high compared with those at equilibrium and so may also be too high in nanoparticles.…”

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confidence: 99%

Sputtering yields of compounds using argon ions

Seah¹,

Nunney²

2010

J. Phys. D: Appl. Phys.

127

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Abstract. An analysis is made of published sputtering yield data for compounds using argon primary ions at normal incidence to evaluate the validity of simple predictive equations. These are sputtering yields at dynamical equilibrium. First, two archetypal compounds are analysed: GaAs with constituent elements of similar atomic number and weak preferential sputtering, and Ta 2 O 5 with constituent elements of widely separate atomic number and strong preferential sputtering. The agreements of the sputtering yields predicted by the semi-empirical linear cascade theory are excellent when the appropriate parameters are interpolated, rather than using an average atomic number. The effect of preferential sputtering is included within the framework of the simple pair-bond theory. The average ratios of the data to the initial predictions for GaAs and Ta 2 O 5 are 1.01 ± 0.06 and 1.00 ± 0.07, respectively. Extension of this analysis to a range of oxides shows that the heat of reaction of the oxidation process needs inclusion. It is here that the effect of preferential sputtering can lead to an expansion of the uncertainties. SiO 2 is often used as a reference material and so the published yield data are analysed in detail. These show an extremely broad scatter and so new experimental data are measured. These new results are in the upper range of previous data and correlate with the semiempirical theory with a scatter of only 9%. These correlations show that the semi-empirical linear cascade theory is excellent for predicting the energy dependence of the yield and can be excellent for absolute yields where the compound heat of formation is low.

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Very large gold and silver sputtering yields induced by keV to MeV energyAunclusters(n=1–13

Cited by 147 publications

References 27 publications

Projectile size effects on cluster formation in sputtering

Projectile size effects on cluster formation in sputtering

Ion and electron irradiation-induced effects in nanostructured materials

Sputtering yields of compounds using argon ions

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