1997
DOI: 10.12693/aphyspola.92.899
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Vibrational Modes in SixGe1-xAlloys: Temperature and Compositional Dependence

Abstract: We report infrared absorption spectra of crystalline Si xGe1-x alloys with silicon content 0 < x < 1 at room and liquid nitrogen temperature. We covered the spectral range from 375 to 1200 cm -1 that includes the "Si-Ge" and "Si-Si" single-phonon transitions, the continuum of two-phonon processes, and the localized mode of interstitial oxygen. We study the change of vibrational structure and correlation between reference (pure Si and Ge) and alloy spectra. We observed shifts to lower wave numbers by about 1 cm… Show more

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Cited by 3 publications
(2 citation statements)
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“…The background lattice absorption, due to the multiplephonon as well as single-phonon (''Si-Si'' and ''Si-Ge'', allowed due to the loss of symmetry in the alloys) transitions, has been reported and analyzed in our previous work [5]. Here, we focus on the infrared absorption due to the antisymmetric stretching vibration of O i causing the ''1106 cm À1 '' room temperature band in Si, for the Si-rich alloys.…”
Section: Introductionmentioning
confidence: 99%
“…The background lattice absorption, due to the multiplephonon as well as single-phonon (''Si-Si'' and ''Si-Ge'', allowed due to the loss of symmetry in the alloys) transitions, has been reported and analyzed in our previous work [5]. Here, we focus on the infrared absorption due to the antisymmetric stretching vibration of O i causing the ''1106 cm À1 '' room temperature band in Si, for the Si-rich alloys.…”
Section: Introductionmentioning
confidence: 99%
“…Si-O-Si absorption peak (λ = 9.2 µm): The increase of propagation losses around 9.2 µm wavelength, reaching 4 dB/cm in TM polarization and 4.6 dB/cm in TE polarization is due to optical absorption from the Si-O-Si vibration of interstitial oxygen (Si:O i ) [24]. As commonly seen in SiGe alloys, the wavelength of this absorption peak is slightly shifted in comparison with the 1106 cm −1 (λ=9.04 µm) absorption peak of Si-O-Si vibration mode in pure Si layers, possibly due to the expansion of Si-Si bonds [25,26] in the SiGe matrix. Secondary ion mass spectrometry (SIMS) characterization has been performed to corroborate the analysis.…”
Section: Substrate Absorptionmentioning
confidence: 91%