2003
DOI: 10.1063/1.1541108
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Viscoelastic stress relaxation in film/substrate systems—Kelvin model

Abstract: Although the Maxwell model was widely applied to analyze viscoelastic behavior of film/substrate systems, Rafferty et al. [Appl. Phys. Lett. 54, 151 (1989)] found that the structural relaxation of silicon oxide films on silicon wafers during thermal annealing could be explained by the Kelvin model but not the Maxwell model. This result motivated us to investigate the relaxation of residual stresses due to viscoelastic deformation in a film/substrate system using the Kelvin model. The system can be a viscoelast… Show more

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Cited by 17 publications
(4 citation statements)
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“…Deborah number (De) was then introduced to investigate the generation of heterogeneity in xerogels, in which both the relaxation time and interaction time was identi ed: De = τ / t int (2) where τ is the relaxation time and t int is the interaction time 38 . The Voigt-Kelvin model was used to describe the stress relaxation behaviors of polymer networks and the τ was obtained from tted results (Fig S12) 39,40 . In combination with the distinct distributions of RH and water contents during the formation of xerogel bers, we comprehensively compared the stress relaxation behaviors in inner part and outer part (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Deborah number (De) was then introduced to investigate the generation of heterogeneity in xerogels, in which both the relaxation time and interaction time was identi ed: De = τ / t int (2) where τ is the relaxation time and t int is the interaction time 38 . The Voigt-Kelvin model was used to describe the stress relaxation behaviors of polymer networks and the τ was obtained from tted results (Fig S12) 39,40 . In combination with the distinct distributions of RH and water contents during the formation of xerogel bers, we comprehensively compared the stress relaxation behaviors in inner part and outer part (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…The Voigt-Kelvin model was used to describe the stress relaxation behaviors of polymer networks, and the τ was obtained from fitted results (Supplementary Fig. 18 ) 44 , 45 . In combination with the distinct distributions of RH and water contents during the formation of xerogel fibers, we comprehensively compared the stress relaxation behaviors in the inner part and outer part (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…The amorphous dielectric films such as SiO 2 can exhibit a viscoelastic behavior. [26][27][28] Above the glass transition temperature, the viscosity of SiO 2 can decrease substantially, and stress relief can occur by shear flow. Thus, when wet oxidation is carried out at 1000°C, the oxide is stress-free after oxidation.…”
Section: Resultsmentioning
confidence: 99%