We report on the development of on-chip microcavities and show their potential as a platform for cavity quantum electrodynamics experiments. Microcavity arrays were formed by the controlled buckling of SiO2/Ta2O5 Bragg mirrors, and exhibit a reflectance-limited finesse of 3500 and mode volumes as small as 35λ3 . We show that the cavity resonance can be thermally tuned into alignment with the D2 transition of 87 Rb, and outline two methods for providing atom access to the cavity. Owing to their small mode volume and high finesse, these cavities exhibit single-atom cooperativities as high as C1 = 65. A unique feature of the buckled-dome architecture is that the strong-coupling parameter g0/κ is nearly independent of the cavity size. Furthermore, strong coupling should be achievable with only modest improvements in mirror reflectance, suggesting that these monolithic devices could provide a robust and scalable solution to the engineering of light-matter interfaces.The implementation of a distributed quantum network could enable a global quantum communication system, [1,2] operations, [7,28] and to implement an elementary quantum network.[29] These works place single-atom quantum systems as a leading candidate for use in large-scale quantum networks. As a result, there is a strong interest in the integration of alkali atoms into robust, scalable, packaged optical cavities. [30,31] Furthermore, it is desirable for these optical cavities to have small mode volumes and be tunable to atomic transitions. [32][33][34] Here we report the development of 'buckled-dome' Fabry-Pérot microcavities designed for cQED applications, specifically on-chip coupling between single photons and single rubidium atoms. These cavities produce high single-atom cooperativities, can be easily tuned to atomic transitions, and can facilitate open-access for incorporation of atoms.The buckled-dome microcavities were fabricated via a monolithic self-assembly procedure. [35,36] First, a distributed Bragg reflector (10.5 periods SiO 2 /Ta 2 O 5 , starting and ending with Ta 2 O 5 ) was deposited on a fused silica substrate by reactive magnetron sputtering. Microcavities were defined by the lithographic patterning of a thin (∼15 nm) low-adhesion fluorocarbon layer, followed by the deposition of a second Bragg reflector identical to the initial reflector. Films with low loss and high compressive stress (∼200 MPa) were realized by using high target power (200 W), elevated substrate temperature (150• C), and low chamber pressure (4 mTorr).[37] Optical constants for single films were measured usarXiv:1601.03344v1 [cond-mat.mes-hall]