2019
DOI: 10.1039/c9cc05376j
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Visualizing anisotropy in the surface oxidation of germanium by wet etching of patterned nanowedges: proof of concept

Abstract: We study the anisotropy in surface oxidation for Ge(100) and (110) in HCl/H2O2 solution complemented by synchrotron X-ray photoemission spectroscopy (SXPS) measurements integrated with an in situ etching chamber.

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Cited by 3 publications
(4 citation statements)
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“…cm -2 min -1 ) showed a linear dependence on the concentration of the strong oxidizing agent H2O2. This linear feature is similar to previously reported nm-scale kinetics for GaAs, InGaAs, and Ge [19][20][49][50][51] and is typical for conditions where surface reactions are rate limiting. Anisotropy in the etching kinetics can be vividly seen for the two surface orientations.…”
supporting
confidence: 89%
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“…cm -2 min -1 ) showed a linear dependence on the concentration of the strong oxidizing agent H2O2. This linear feature is similar to previously reported nm-scale kinetics for GaAs, InGaAs, and Ge [19][20][49][50][51] and is typical for conditions where surface reactions are rate limiting. Anisotropy in the etching kinetics can be vividly seen for the two surface orientations.…”
supporting
confidence: 89%
“…The ICP-MS data (Figure 1) confirm a higher chemical stability for both InAs (111) orientations in HCl/ H2O2 solution. We attribute this observation to a chloride passivation that stabilizes the surface that is also observed for other III-V [19][20]65 and group IV [49][50][51] semiconductors. Furthermore, the (111)-B plane demonstrated the highest overall chemical reactivity in the studied acidic H2O2 solutions and a larger coverage of corresponding chloride and sulfate species (Figure S1, S3).…”
supporting
confidence: 62%
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“…Other factors may affect the lateral etch rate. One is the difference in crystal orientation (blanket (001) vs. superlattice (110)) [14] and the difference in crystal quality. More work is needed to understand the effect of the structure and pH.…”
mentioning
confidence: 99%