Voltage characteristics of planar galvanomagnetic effect in thin ferromagnetic films

Sczaniecki, Z.; Gontarz, R.; Kwiatkowski, W.; Ratajczak, H.

doi:10.1002/pssa.2210070235

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1971

1999

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Measurement ofHk andHc in thin ferromagnetic films by theMs vibration method in low frequency field

Sczaniecki

Gontarz

Ratajczak

1971

Phys. Stat. Sol. (a)

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A method is presented of measuring the uniaxial anisotropy field Hk and coercive force Hc by forced vibrations of the magnetization vector Ms in two mutually perpendicular fields lying in the film plane, one of which, of low intensity, varies sinusoidally. The vibration amplitude of Ms exhibits maxima as a function of the dc field from which positions Hk or Hc can be determined according to the case whether the easy axis is directed perpendicular or parallel to the dc field. Theoretical predictions are confirmed experimentally using the planar galvanomagnetic effect for measuring the Ms vector amplitude. The influence of the amplitude of an ac field on the positions of the maxima is discussed.

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