2013
DOI: 10.1016/j.orgel.2013.02.023
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Voltage-readable nonvolatile memory cell with programmable ferroelectric multistates in organic inverter configuration

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Cited by 5 publications
(9 citation statements)
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“…The basic fabrication process for the FeOFETs followed that of previous reports. 12,20) Glass substrates were cleaned sequentially with acetone, isopropyl alcohol, methyl alcohol, and deionized water in an ultrasonicater for 10 min each. For the gate electrode, 50-nm-thick aluminum was thermally deposited on the glass substrate through a shadow mask.…”
Section: Experimental Methodsmentioning
confidence: 99%
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“…The basic fabrication process for the FeOFETs followed that of previous reports. 12,20) Glass substrates were cleaned sequentially with acetone, isopropyl alcohol, methyl alcohol, and deionized water in an ultrasonicater for 10 min each. For the gate electrode, 50-nm-thick aluminum was thermally deposited on the glass substrate through a shadow mask.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…For the off-(erased) state, a large positive gate voltage (60 V) was applied, and the source and drain electrodes were grounded. 20) In this study, the memory-off state was measured initially, and the memory-on state was measured subsequently. In this regard, there was not any electrical difference, even if the off-and on-current measurement order was inverted.…”
Section: Memory Properties Of the Scc-processed Feofetmentioning
confidence: 99%
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“…The thickness of the P(VDF-TrFE) film was measured to be 630 nm. For the interconnection of the memory transistor and the selection transistor, a via hole was produced using a solvent-drop method [3,6]. In fabricating a selection transistor, a fluorinated polymer (NovecTM EGC-1700, 3M) was chosen as the PDL which was patterned on the ferroelectric insulator by transferprinting [6,7].…”
Section: Methodsmentioning
confidence: 99%
“…For a single cell, the rewritability of the ferroelectric memory is typically achieved using the polarization direction of the ferroelectric insulator [1,2,6]. However, this approach will not be applicable for an array with multiple cells because of the crosstalk among the cells in the same row or column.…”
Section: Introductionmentioning
confidence: 99%