Voltammetric and structural characterization of sputter deposited Al–Mg films

We report the first preparation of nanoporous Al-Mg alloy films by selective dissolution of Mg from a Mg-rich AlxMg1-x alloy. We show how to tune the stoichiometry, the porosity and the oxide contents in the final film by modulating the starting ratio between Al and Mg and the dealloying procedure. The obtained porous metal can be exploited for enhanced UV spectroscopy. In this respect, we experimentally demonstrate its efficacy in enhancing fluorescence and surface Raman scattering for excitation wavelengths of 360 nm and 257 nm respectively. Finally, we numerically show the superior performance of the nanoporous Al-Mg alloy in the UV range when compared to equivalent porous gold structures.The large area to surface ratio provided by this material make it a promising platform for a wide range of applications in UV/deep-UV plasmonics. IntroductionDuring the last decade, Localized Surface Plasmon Resonances (LSPRs) have been explored extensively for their various technological applications such as surface-enhanced Raman spectroscopy (SERS), metal-enhanced fluorescence (MEF), plasmon enhanced light harvesting, and photocatalysis. 1-7 Plasmonic applications have been mainly based on noble metals (e.g. Ag and Au) because of their good chemical stability even though their application is limited to the visible/ NIR range. 4,8,9 However, the advantages of extending plasmonic enhancements down to UV and deep-UV (DUV) wavelengths are drawing interests on alternative materials. 10-12 For example, UV and DUV excitations can be uniquely exploited to extend Raman spectroscopy to biomolecules with vanishing Raman cross sections in the visible and NIR regions. [13][14][15][16] Beside Magnesium, Gallium, Indium, and Ruthenium, Aluminum (Al) has been suggested as a promising plasmonic material in the UV and DUV regions 17-23 because its large plasma frequency leads to a negative permittivity (real part) down to wavelengths of ≈100 nm. 24,25 Aluminum also exhibits strong enhanced local fields owing to its high electron density (3 valence electrons per atom compared to 1 valence electron per atom in metals such as Au or Ag) and its overall optical properties make it an excellent material for UV nanoantennas, 20,26,27 DUV SERS, 28-31 light emission enhancement of wide-bandgap semiconductors, 23 improvement of light harvesting in solar cells, and UV MEF. 17,32 Al nanostructures are generally designed with the help of electron beam lithography (EBL) and focused ion beam (FIB) lithography in order to obtain well-controlled designs. 20,26 However, since very small nanostructures/nanogaps (5-10 nm) are required to achieve plasmonic resonances in the DUV, and considering the long fabrication processes involved, these top-down techniques are not costeffective and not recommended for large area fabrication (cm 2 ). 20,26 Several bottom-up approaches have been attempted in order to circumvent these difficulties, like nanoimprint lithography, 31 electrochemical anodization, 18 and chemical synthesis of aluminum nanocrystals. 33,34 Among the n...

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“…(Only few peaks are present in the measured patterns because of the strong preferential orientation of the crystals within the Al–Mg layers. ) − …”

Section: Resultsmentioning

confidence: 99%

Metallic Nanoporous Aluminum–Magnesium Alloy for UV-Enhanced Spectroscopy

et al. 2019

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“…In this estimation, D(2u) was corrected by subtracting it from an analogous value for a reference sample [22] with g > 10 mm to correct for the effect of instrumental broadening [23]. The grain size for the as-sputtered the T s of 450 8C was found to be g $ 132 nm.…”

Section: Xrd Measurementsmentioning

confidence: 99%

Low-temperature growth of polycrystalline Ge thin film on glass by in situ deposition and ex situ solid-phase crystallization for photovoltaic applications

Tsao

Weber

Campbell

et al. 2009

Applied Surface Science

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“…Gaminių iš magnio ir jo lydinių naudojimas jūrinėje ir pajūrio aplinkoje, t. y. padidėjusios chloridų koncentracijos ir drėgmės zonoje, susiduria su dar didesnėmis problemomis. Pagrindinė greito korodavimo priežastis yra mažas paviršinio magnio hidroksido sluoksnio korozinis atsparumas (Jones 1996;Grigucevičienė et al 2004a). Magnio lydinių korozinio atsparumo didinimo būdų paieška yra aktuali šiandienos medžiagotyros problema.…”

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Investigation Into the Structure and Corrosion Resistance of Mg-Al and Mg-Al-Zr Coatings Produced by Magnetron Sputtering / Magnetroninių Mg-Al, Mg-Al-Zr Ir Zr Dangų Struktūros Ir Korozinio Atsparumo Tyrimas

Lukauskaitė

Valiulis

2012

Mokslas - Lietuvos Ateitis

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Vilniaus Gedimino technikos universitetas El. paštas: 1 raimonda.lukauskaite@vgtu.lt; 2 algirdas.valiulis@vgtu.lt Santrauka. Plonos, 1-2 μm storio, Mg-Al ir Mg-Al-Zr lydinių ir gryno Zr dangos buvo suformuotos ant stiklinių padėklų magnetroninio nusodinimo metodu. Šių dangų struktūra ir morfologija tirta fizikiniais analizės metodais: rentgeno spindulių difrakcija (toliau -RSD) ir atominės jėgos mikroskopija (toliau -AJM). Korozinis dangų atsparumas vertintas veikiant 0,1 M NH 4 BO 3 ir 0,1 M NaCl tirpalu (pH = 8,6), be to, atlikti anodinės poliarizacijos tyrimai. Magnetroniniu būdu nusodintų dangų korozinis atsparumas lygintas su tradiciniais metalurginiais metodais pagamintų cirkonio ir Mg-Al lydinių koroziniu atsparumu. Nustatytos koreliacijos tarp lydinių struktūros ir korozinio atsparumo.Reikšminiai žodžiai: Mg-Al, Mg-Al-Zr lydiniai, magnetroninis nusodinimas, korozija. AbstractThin cathode layers of 200 nm thickness of Mg-Al and Mg-Al-Zr alloys and pure Zr were formed on glass substrates using a magnetron sputtering technique. X-ray diffraction and atomic force microscopy were used for structure and morphology analysis of magnetron sputtered alloys. The corrosion resistance of the sputtered Mg-Al and Mg-Al-Zr coatings in 0.1 M (NH 4 ) 3 BO 3 and 0.1 M NaCl solution (pH = 8.6), was evaluated according to anodic polarization behavior.

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Voltammetric and structural characterization of sputter deposited Al–Mg films

Cited by 25 publications

References 37 publications

Metallic Nanoporous Aluminum–Magnesium Alloy for UV-Enhanced Spectroscopy

Metallic Nanoporous Aluminum–Magnesium Alloy for UV-Enhanced Spectroscopy

Low-temperature growth of polycrystalline Ge thin film on glass by in situ deposition and ex situ solid-phase crystallization for photovoltaic applications

Investigation Into the Structure and Corrosion Resistance of Mg-Al and Mg-Al-Zr Coatings Produced by Magnetron Sputtering / Magnetroninių Mg-Al, Mg-Al-Zr Ir Zr Dangų Struktūros Ir Korozinio Atsparumo Tyrimas

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