2003
DOI: 10.1016/s0040-6090(03)00378-x
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Volume and heterogeneous chemistry of active species in chlorine plasma

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Cited by 13 publications
(8 citation statements)
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“…It is important to note also that the rate coefficient of R2 is much lower compared with k 1 and k 3 due to the sufficient differences in cross-sections for corresponding processes: k 1 /k 2 and k 3 /k 2 are 73-69 and 30-87, respectively, for 2 Pa at 700 W or 86-75 and 9-23 for 0.5 Pa at 700 W. From these data, one can conclude that the reaction R2 has a near-to-negligible influence on the formation kinetics for both negative and positive ions. The conclusions on the electron impact kinetics made above work for all investigated range of process parameters and show a good agreement with several published papers for both high-pressure [34] and low-pressure [17,22] chlorine-containing plasmas. Fig.…”
Section: Resultssupporting
confidence: 90%
“…It is important to note also that the rate coefficient of R2 is much lower compared with k 1 and k 3 due to the sufficient differences in cross-sections for corresponding processes: k 1 /k 2 and k 3 /k 2 are 73-69 and 30-87, respectively, for 2 Pa at 700 W or 86-75 and 9-23 for 0.5 Pa at 700 W. From these data, one can conclude that the reaction R2 has a near-to-negligible influence on the formation kinetics for both negative and positive ions. The conclusions on the electron impact kinetics made above work for all investigated range of process parameters and show a good agreement with several published papers for both high-pressure [34] and low-pressure [17,22] chlorine-containing plasmas. Fig.…”
Section: Resultssupporting
confidence: 90%
“…As to negative ions, their relative and absolute concentration is 1.5-2 times lower compared to the case of Cl 2 plasma in the similar range of external discharge parameters [20]. At P = = 40-300 Pa, the value of in HCl plasma increases in the range from 74 to 206 (compare with β = 150 to 313 for Cl 2 plasma [20,21]). …”
Section: The Kinetics Of Generation and Loss Of Charged Particlesmentioning
confidence: 92%
“…1. Compared to the case of Cl 2 plasma [20,21], the EEDF in hydrogen chloride is depleted in electrons in the region up to 5 eV; however, it exhibits a more developed middle part, which is associated with the specifics of the set of elementary processes for HCl molecule. For example, the dip in the low-energy region is due to the loss of energy in the processes of excitation of rotational and vibrational levels.…”
Section: Processmentioning
confidence: 99%
“…The rate con- where F(ε) is the electron energy distribution function (EEDF) determined in solving the Boltzmann equation, and ε th and σ(ε) denote the threshold energy and the cross section of the process, respectively. The collection of processes (Table 1), respective cross sections, and kinetic coefficients was formed using the data of [4,8,[12][13][14].…”
Section: Simulation Of Plasmamentioning
confidence: 99%
“…Analysis of literature data (for example, [3][4][5][6]) leads one to conclude that some aspects of the kinetics and mechanisms of plasma-chemical reactions have been studied in sufficient detail; however, complex treatment is lacking of the interrelationship between the external parameters of plasma, of the regularities of the physicochemical processes of generation and loss of active particles, and of the steady-state mass composition of the gas phase of discharge. This makes impossible correct analysis of the mechanisms of interaction of active particles of plasma with the surface; for numerous plasma-solid systems, these mechanisms are postulated without adequate reasoning.…”
Section: Introductionmentioning
confidence: 99%