2021
DOI: 10.1109/tsm.2021.3068974
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Wafer Reflectance Prediction for Complex Etching Process Based on K-Means Clustering and Neural Network

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Cited by 11 publications
(4 citation statements)
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“…However, PCA-based approaches project features to another space based on a linear combination of original features. Therefore they cannot be interpreted in the original feature space [13], [17]. Moreover, most PCA-related work has considered linear PCA, which is not efficient in exploring non-linear patterns [14]- [16].…”
Section: Related Workmentioning
confidence: 99%
“…However, PCA-based approaches project features to another space based on a linear combination of original features. Therefore they cannot be interpreted in the original feature space [13], [17]. Moreover, most PCA-related work has considered linear PCA, which is not efficient in exploring non-linear patterns [14]- [16].…”
Section: Related Workmentioning
confidence: 99%
“…Developing new enabling technologies can help alleviate the situation. Artificial intelligence (AI) has made its way into different areas, e.g., engineering [4], [5], urban planning [6], and management [7]. AI-based models are incorporated in different fields of study, such as manufacturing, to solve various problems, such as process planning, route optimization, and extracting insights from sensor data [8]- [11].…”
Section: Introductionmentioning
confidence: 99%
“…Developing new enabling technologies can help alleviate the situation. Artificial Intelligence (AI) has made its way into different areas, e.g., engineering [4], [5], urban planning [6], and management [7]. AI-based models are incorporated in different fields of study, such as manufacturing, to solve various problems like process planning, route optimization, and extracting insights from sensor data [8]- [11].…”
Section: Introductionmentioning
confidence: 99%