2023
DOI: 10.1016/j.snb.2023.133560
|View full text |Cite
|
Sign up to set email alerts
|

Wafer-scale low-cost complementary vertically coupled plasmonic structure for surface-enhanced infrared absorption

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
2
0

Year Published

2023
2023
2024
2024

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 5 publications
(2 citation statements)
references
References 56 publications
0
2
0
Order By: Relevance
“…Nanoantenna structures supporting LSPR offer a way to break the optical diffraction limit by concentrating light into subwavelengths [6][7][8][9]. The distribution of the electric field depends on the configuration of plasmonic nanoantenna, which typically exhibits strong enhancement and localization on the surface of the antenna, especially at the smaller tips and gaps of dimers or polymers [10][11][12][13][14][15]. In recent years, the enhanced electric filed due to plasmon coupling effect can improve molecular absorption and has been applied to many optical and sensing fields, including surface-enhanced Raman scattering (SERS), surfaced-enhanced fluorescence (SEF) and single molecule detection technology [16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…Nanoantenna structures supporting LSPR offer a way to break the optical diffraction limit by concentrating light into subwavelengths [6][7][8][9]. The distribution of the electric field depends on the configuration of plasmonic nanoantenna, which typically exhibits strong enhancement and localization on the surface of the antenna, especially at the smaller tips and gaps of dimers or polymers [10][11][12][13][14][15]. In recent years, the enhanced electric filed due to plasmon coupling effect can improve molecular absorption and has been applied to many optical and sensing fields, including surface-enhanced Raman scattering (SERS), surfaced-enhanced fluorescence (SEF) and single molecule detection technology [16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…16 In most cases, SEIRAS substrates are achieved through lithographic techniques, such as electron beam lithography (EBL), nanosphere lithography (NSL), photolithography (PL), or colloidal self-assembly (LSA), because they have the capability of producing precise and reproducible patterns of metallic substrates. 17 However, besides being time-consuming, these techniques are extremely expensive. Alternative approaches include nano stencil lithography (NSL), which enables the production of a controlled surface for SEIRAS.…”
mentioning
confidence: 99%