2023
DOI: 10.1016/j.ceramint.2022.09.162
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Water engineering in lead free CsCu2I3 perovskite for high performance planar heterojunction photodetector applications

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Cited by 14 publications
(9 citation statements)
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“…They have been widely used in communication technology, scientific measurement, astronomy observation, fire monitoring, and biomedical research. Si-based photodetectors possess an incomparable advantage because of their compatibility with the microelectronics industry . Si-based photodetectors are mainly used to detect visible and near-infrared (NIR) light, while compound semiconductors such as GaN are commonly used to detect ultraviolet (UV) light. , Nevertheless, the responsivity of most commercialized silicon photodetectors compatible with semiconductor technology remains at 0.7 A/W, , except for some silicon photodetectors with a complex preparation process, high cost, and preparation conditions that are difficult to control.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…They have been widely used in communication technology, scientific measurement, astronomy observation, fire monitoring, and biomedical research. Si-based photodetectors possess an incomparable advantage because of their compatibility with the microelectronics industry . Si-based photodetectors are mainly used to detect visible and near-infrared (NIR) light, while compound semiconductors such as GaN are commonly used to detect ultraviolet (UV) light. , Nevertheless, the responsivity of most commercialized silicon photodetectors compatible with semiconductor technology remains at 0.7 A/W, , except for some silicon photodetectors with a complex preparation process, high cost, and preparation conditions that are difficult to control.…”
Section: Introductionmentioning
confidence: 99%
“…5 Si-based photodetectors are mainly used to detect visible and near-infrared (NIR) light, 6 while compound semiconductors such as GaN are commonly used to detect ultraviolet (UV) light. 7,8 Nevertheless, the responsivity of most commercialized silicon photodetectors compatible with semiconductor technology remains at 0.7 A/ W, 9,10 except for some silicon photodetectors 11−14 with a complex preparation process, high cost, and preparation conditions that are difficult to control.…”
Section: ■ Introductionmentioning
confidence: 99%
“…Finally, we fabricated patterned thin films for device applications. An attempt was reported to create an interface between CsCu 2 I 3 and CuI by partially decomposing CsCu 2 I 3 with water . However, the difficulty of morphology control is an obstacle for device applications.…”
Section: Discussionmentioning
confidence: 99%
“…An attempt was reported to create an interface between CsCu 2 I 3 and CuI by partially decomposing CsCu 2 I 3 with water. 41 However, the difficulty of morphology control is an obstacle for device applications. The RT-SSR of bilayered CsI and CuI is suitable to be applied to thin-film patterning with shadow masks for device fabrication.…”
Section: Solid-state Reaction Of Bilayered Cui and Csimentioning
confidence: 99%
“…[29] Jie Yang et al fabricated a deep-UV photodetector based on the CsCu 2 I 3 thin-film structure, and the device showed almost no response to 405 nm visible light but was sensitive to 265 and 365 nm light, demonstrating good UV detection capability. [24] Even though several methods for the preparation of CsCu 2 I 3 -based photodetectors have been reported so far, such as the antisolvent-assisted crystallization method mentioned above, [22][23][24]27,[29][30][31][32] as well as space-confined crystallization method, [33,34] pulsed laser deposition method, [35] and vacuum thermal evaporation method. [26] However, all these methods are suffering from the disadvantages of difficult control of crystal size and shape and random crystal orientation, which hinder their integrated optoelectronic applications.…”
Section: Introductionmentioning
confidence: 99%